Ober Publications

(Last updated: December 24, 2007)

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(*Refereed Papers)

Manuscripts In Preparation

* J. Pablo Bravo-Vasquez, Young-Je Kwark, Heidi B. Cao, Hai Deng and Christopher K. Ober, “Chemically Amplifiable Polysilanes: Synthesis and Applications as EUV Resists”, J. Mater. Chem., in preparation.

* Nelson M. Felix, Anuja De Silva, and Christopher K. Ober, “Calix[4]resorcinarene Derivatives as High Resolution Photoresist Materials for Supercritical CO₂ Processing”, Adv. Mater., accepted.

* Nelson Felix and Christopher K. Ober, “Acid-Labile, Chain-Scission Polymer Systems Used as Positive-Tone Photoresists Developable in Supercritical CO₂”, Chem. Mater., submitted.

* Anuja De Silva and Christopher K. Ober, “Hydroxyphenylbenzene Derivatives as Glass Forming Molecules for High Resolution Photoresists”, J. Mater. Chem., submitted.

* J. K. Bosworth, M. Y. Paik, R. Ruiz, E. L. Schwartz, J. Q. Huang, A. W. Ko, D.-M. Smilgies, C. T. Black and C. K. Ober,” Control of Self Assembly of Lithographically-Patternable Block Copolymer Films”, Nature Materials, submitted.

* Ha Soo Hwang, Alexander A. Zakhidov, Jin-kyun Lee, Xavier André, John A. DeFranco, Hon Hang Fong, Andrew B. Holmes, George G. Malliaras, Christopher K. Ober, “Dry Photolithographic Patterning Process for Organic Electronic Devices using Supercritical Carbon Dioxide as a Solvent”, Nature Materials, submitted.

2007

* Anuja De Silva, Jin Kyun Lee, Xavier André, Nelson M. Felix, Heidi B. Cao, Hai Deng and Christopher K. Ober, “Study of the Structure-Properties Relationship of Phenolic Molecular Glass Resists for Next Generation Photolithography”, Chem. Mater., in press.

* Nagarajan, Sivakumar; Bosworth, Joan; Ober, Christopher; Russell, Thomas; Watkins, James, “Simple Fabrication of Micropatterned Mesoporous Silica Films Using PAGs in Block Copolymers”, Chem. Mater., in press.

* Sivakumar Nagarajan, Rajaram A. Pai, Thomas P. Russell, James J. Watkins, Mingqi Li, Katy S. Bosworth, Detlef-M. Smilgies, Christopher K. Ober, “An Efficient Route to Mesoporous Silica Films with Perpendicular Nanochannels”, Chem. Mater., in press.

* John A Finlay, Sitaraman Krishnan, Maureen E Callow, James A Callow, Rong Dong, Nicola Asgill, Kaiming Wong, Edward J Kramer, Christopher K. Ober, “Settlement of Ulva Zoospores on Patterned Fluorinated and PEGylated Monolayer Surfaces”, Langmuir, ASAP.

* Nelson M. Felix, Anuja De Silva, Camille Man Yin Luk and Christopher K. Ober, “Dissolution Phenomena of Phenolic Molecular Glass Photoresist Films in Supercritical CO₂”, J. Mater. Chem., (2007), 17(43), 4598-4604.

* Frauke Pfeiffer, Nelson M. Felix, Christian Neuber, Christopher K. Ober, and Hans-Werner Schmidt, “Towards Environmentally Friendly, Dry Deposited, Water Developable Molecular Glass Photoresists”, Advanced Materials, in press.

Joan K. Bosworth, Xavier Andre, Evan L. Schwartz, Ricardo Ruiz, Charles T. Black and Christopher K. Ober, "Control of Morphology Orientation in Lithographically Patternable Diblock Copolymers", Journal of Photopolymer Science and Technology, (2007), 20(4), 519-522.

* Rong Dong, Sitaraman Krishnan, Barbara A. Baird, Manfred Lindau, Christopher K. Ober*, “Patterned Biofunctional Polymer Brushes”, Biomacromolecules, , (2007), 8(10), 3082-3092.

Xavier André, Jin Kyun Lee, Anuja DeSilva, Christopher K. Ober, Heidi B. Cao, Hai Deng, Hiroto Kudo, Daisuke Watanabe, Tadatomi Nishikubo, "Phenolic Molecular Glasses as Resists for Next Generation Lithography", Proceedings of SPIE-The International Society for Optical Engineering (2007), 6519(Pt. 2, Advances in Resist Materials and Processing Technology XXIV), 65194B/1-65194B/10.

* Frauke Pfeiffer, Nelson Felix, Christian Neuber, Christopher K. Ober, Hans-Werner Schmidt, “Physical Vapor Deposition of Chemically Amplified Photoresists: A New Route to Patterning Molecular Glass Resists”, Adv. Func. Mater., in press.

* Niamsiri, Nuttawee; Bergkvist, Magnus; Delamarre, Soazig C.; Cady, Nathan C.; Coates, Geoffrey W.; Ober, Christopher K.; Batt, Carl A. Insight in the role of bovine serum albumin for promoting the in situ surface growth of polyhydroxybutyrate (PHB) on patterned surfaces via enzymatic surface-initiated polymerization. Colloids and Surfaces, B: Biointerfaces (2007), 60(1), 68-79.

* Daniel Bratton, Ramakrishnan Ayothi, Hai Deng, Heidi B. Cao and Christopher K. Ober, “Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification ”, Chem. Mater., 19(15); 3780-3786 (2007)

* Birger Lange, Shalin J. Jhaveri, Lorenz Steidl, R. Ayothi and Christopher K. Ober, Rudolf Zentel, "Creating defined 3D defects inside an opaline Ormocer® matrix with two-photon lithography”, Macromol. Rapid Commun., 2007, 28, 922–926.

* Marvin Y. Paik, Sitaraman Krishnan, Fengxiang You, Xuefa Li, Yushi Ando, Seok Ho Kang, Alexander Hexemer, Edward J. Kramer, Daniel A. Fischer, Christopher K. Ober, “Surface organization, light-driven surface changes and stability of semifluorinated azobenzene polymers”, Langmuir, 2007, 23, 5110-5119.

* R. Ayothi, Y. Yi, H. Cao, Y. Wang, S. Putna, C. K. Ober, “Arylonium photoacid generators containing environmentally compatible aryloxyperfluoroalkanesulfonate groups”, Chem. Mater., 19(6): 1434-1444 (2007).

Bosworth, Joan K.; Schwartz, Evan L.; Huang, Jenny Q.; Ko, Albert W.; Ruiz, Ricardo; Black, Charles T.; Ober, Christopher K.. Graphoepitaxy and orientational control of lithographically patternable diblock copolymers by solvent annealing. PMSE Preprints (2007), 96 659-660.

Weinman, Craig J.; Krishnan, Sitaraman; Park, Daewon; Paik, Marvin Y.; Wong, Kaiming; Fischer, Daniel A.; Handlin, Dale L.; Kowalke, Greg L.; Wendt, Dean E.; Sohn, Karen E.; Kramer, Edward J.; Ober, Christopher K.. Antifouling block copolymer surfaces that resist settlement of Barnacle Larvae. PMSE Preprints (2007), 96 597-598.

* Peter Busch, Sitaraman Krishnan, Marvin Paik, Gilman E.S. Toombes, Detlef-M. Smilgies, Sol M. Gruner and Christopher K. Ober, “Surface induced tilt propagation in thin films of semifluorinated liquid-crystalline side-chain block copolymers”, Macromolecules, 40(1): 81-89 (2007).

* Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix and Christopher K. Ober, “Applications of Controlled Macromolecular Architectures to Lithography”, in Macromolecular Engineering: From Precise Macromolecular Synthesis to Macroscopic Materials Properties and Application, K. Matykaszewski, Y. Gnanou and L. Leibler, eds., Wiley-VCH, Weinheim, 2007.

2006

* Mingqi Li, Christopher K. Ober, “High Resolution Patterning with Block Copolymers”, Materials Today, Volume 9, Issue 9, September 2006, Pages 30-39.

* Sitaraman Krishnan, Rebekah J. Ward, Alexander Hexemer, Kristen L. Lee, Esther R. Angert, Daniel A. Fischer, Edward J. Kramer, Christopher K. Ober, “Surfaces of Fluorinated Pyridinium Block-Copolymers with Enhanced Antibacterial Activity”, Langmuir, 22 (26): 11255-11266 (2006).

* Young-Je Kwark, J. Pablo Bravo, Manish Chandhok, Heidi Cao, Hai Deng and Christopher K. Ober,“Absorbance Measurement of Polymers at EUV Wavelength: Correlation between experimental and theoretical calculations”, JVSTB, B 24 (4): 1822-1826 JUL-AUG 2006.

* Young-Je Kwark, J. Pablo Bravo, Manish Chandhok, Heidi Cao, Hai Deng and Christopher K. Ober, “Absorbance Measurement of Polymers at EUV Wavelength: Correlation between experimental and theoretical calculations”, JVSTB, B 24 (4): 1822-1826 JUL-AUG 2006.

* Fengxiang You, Marvin Y. Paik, Michael Häckel, Lothar Kador, Daniela Kropp, Hans-Werner Schmidt, Christopher K. Ober, “Suppressing Surface Relief Gratings in Liquid Crystalline Perfluoralkyl-azobenzene Polymers”, Adv. Func. Mater., 16 (12): 1577-1581 AUG 4 2006.

* Young-Je Kwark, J. Pablo Bravo, Manish Chandhok, Heidi Cao, Hai Deng and Christopher K. Ober, “Absorbance Measurement of Polymers at EUV Wavelength: Correlation between experimental and theoretical calculations”, JVSTB, submitted.

* Sitaraman Krishnan, Nick Wang, Christopher K. Ober,* John Finlay, Maureen E. Callow, James A. Callow, Alexander Hexemer, Edward J. Kramer, Daniel A. Fischer, “Comparison of the Fouling Release Properties of Hydrophobic Fluorinated and Hydrophilic PEGylated Block Copolymer Surfaces: Attachment Strength of the Diatom Navicula and the Green Alga Ulva”, Biomacromolecules, (2006), 7(5), 1449-1462.

* Junyan Dai, Seung Wook Chang, Alyssandrea Hamad, Da Yang, Nelson Felix, Christopher K. Ober, “Molecular Glass Resists For High Resolution Patterning”, Chem. Mater., 18(15): 3404-3411 2006.

* Wageesha Senaratne, Kazutake Takada, Raibatak Das, Jamie Cohen, Héctor D. Abruña, Barbara Baird and Christopher K. Ober, “Dinitrophenyl Ligand Substrates and their Application to Immunosensors”, Biosensors and Bioelectronics, 2006, Vol 22/1 pp 63-70.

Shalin J. Jhaveri, Wageesha Senaratne, Matthew R. Hynd, James N.Turner, Barbara Baird, William Shain and Christopher K. Ober, “Defining the Biology-Materials Interface using both 2D and 3D Lithography”, Journal of Photopolymer Science & Technology, 19(4): 435-440 2006.

Ramakrishnan Ayothi, Seung Wook Chang, Nelson Felix, Heidi B. Cao, Hai Deng, Wang Yueh, Christopher K. Ober, “New PFOS Free Photoresist Systems for EUV Lithography”, Journal of Photopolymer Science & Technology, 19(4): 515-520 2006.

Lange, Birger; Zentel, Rudolf; Jhaveri, Shalin J.; Ober, Christopher K. 3D defect engineering in polymer opals. Proceedings of SPIE-The International Society for Optical Engineering (2006), 6182(Photonic Crystal Materials and Devices III), 61821W/1-61821W/11.

* J. Y. Mao, N. Felix, P. Nguyen, C. K. Ober and K. K. Gleason, “Positive and Negative Tone Chemical Vapor Deposited Polyacrylic E-beam Resists Developable by Supercritical CO2”, Advanced Materials, Chem. Vap. Deposition 2006, 12, 259–262.

Anuja De Silva, Drew Forman, Christopher K. Ober, “Molecular Glass Resists for EUV Lithography”, Proceedings of SPIE-The International Society for Optical Engineering (2006), 6153 615341.

Ramakrishnan Ayothi, Yi Yi, Christopher K Ober, Steve Putna, Wang Yueh and Heidi Cao, “All-organic Non-PFOS Nonionic Photoacid Generating Compounds with Functionalized Fluoroorganic Sulfonate Motif for Chemically Amplified Resists”, Proceedings of SPIE-The International Society for Optical Engineering (2006), 6153 -61530J.

Shinji Tanaka, Christopher K Ober, “Adamantane Based Molecular Glass Resists for 193nm Lithography”, Proceedings of SPIE-The International Society for Optical Engineering (2006), 6153 - 61532B.

Nelson Felix, Kousuke Tsuchiya, Camille Man Yin Luk and Christopher K. Ober, “Supercritical CO2 for High Resolution Photoresist Development”, Proceedings of SPIE-The International Society for Optical Engineering (2006), 6153 61534B.

Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, Heidi Cao, Hai Deng, Christopher K. Ober, “Molecular Glass Resists for Next Generation Lithography”, Proceedings of SPIE-The International Society for Optical Engineering (2006), 6153 61531D.

* Sitaraman Krishnan, Ramakrishnan Ayothi, Alexander Hexemer, John Finlay, Karen Sohn, Ruth Perry, Christopher K. Ober, Edward J. Kramer, Maureen E. Callow, James A. Callow, Daniel Fischer, “Anti-Biofouling Properties of Comb-Like Block Copolymer with Amphiphilic Side-Chains”, Langmuir, (2006), 22(11), 5075-5086.

Lange, Birger; Zentel, Rudolf; Ober, Christopher K. “Methods for the preparation of defined embedded defects in polymer opals.” Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2006), 47(1), 517-518.

Sitaraman Krishnan, Christopher K. Ober, Alexander Hexemer, Edward. J. Kramer, and Daniel A. Fischer, “Compositional depth profiling of block copolymer surfaces using NEXAFS”, PMSE Preprints, (2006), 94 672-673.

Ramakrishnan Ayothi, Yi Yi, Nelson Felix, Christopher K. Ober, Heidi Cao and Wang Yueh, “Non-PFOS photoacid generating compounds for chemically amplified resists”, Polymer Preprints, (2006), 47(1), 528-529.

Shalin J. Jhaveri, Christopher A. Coenjarts, Loon-Seng Tan, Matthew R. Hynd, Ramamurthi Kannan, Richard A. Vaia, James N. Turner, William Shain, and Christopher K. Ober. “Two-photon 3-D patterning of gels and elastomers”, PMSE Preprints, (2006), 94, 44-45.

* Wageesha Senaratne, Prabuddha Sengupta, Vladimir Jakubek, David Holowka, Christopher K. Ober and Barbara Baird, “Self-assembled monolayer functionalized surface arrays for investigating immune cell signaling”, JACS, (2006), 128(17), 5594-5595.

* Osuji, Chinedum O.; Chao, Chi-Yang; Ober, Christopher K.; Thomas, Edwin L. “Supramolecular Microphase Separation in a Hydrogen-Bonded Liquid Crystalline Comb Copolymer in the Melt State”, Macromolecules, (2006), 39(9), 3114-3117.

* Seung Wook Chang, Ramakrishnan Ayothi,Daniel Bratton, Da Yang, Nelson Felix, Heidi B. Cao, Hai Deng and Christopher K. Ober, “Sub 50 nm Feature Sizes using Positive Tone Molecular Glass Resists for EUV Lithography”, J. Mater. Chem., 2006, 16, 1470.

Ober, Christopher; Ueda, Mitsuru. Cornell University, USA. Editorial. Polymers for Advanced Technologies (2006), 17(2), 71.

* Daniel Bratton, Da Yang, Junyan Dai and Christopher K. Ober, “Recent progress in high resolution lithography”, Polymers for Advanced Technology, 2006: 17: 94-103.

* Nelson M. Felix, Kosuke Tsuchiya, and Christopher K. Ober, “High-Resolution Patterning Using Molecular Glasses and Supercritical Carbon Dioxide”, Adv. Mater., (2006), 18(4), 442-446.

* Da Yang, Seung Wook Chang, Christopher K. Ober, “Molecular Glass Photoresists for Advanced Lithography”, J. Mater. Chem., 2006, 16, 1693 - 1696.

* Kim, Young-Rok; Paik, Hyun-Jong; Ober, Christopher K.; Coates, Geoffrey W.; Mark, Sonny S.; Ryan, Thomas E.; Batt, Carl A. Real-time analysis of enzymatic surface-initiated polymerization using surface plasmon resonance (SPR). Macromolecular Bioscience (2006), 6(2), 145-152.

2005

*Mingqi Li, Christopher Coenjarts and Christopher K. Ober, "Patternable Block Copolymers", in Block Copolymers II, Advances in Polymer Science, V. Abetz, ed., 190 pp. 183 – 226, Springer (Heidelberg) 2005

*Da Yang, Shalin J. Jhaveri, and Christopher K. Ober, Three-Dimensional Microfabrication by Two-Photon Lithography, MRS Bulletin, 30 (12), 976-982 (2005).

*Galli, G.; Martinelli, E.; Chiellini, E.; Ober, C. K.; Glisenti, A. Low Surface Energy Characteristics of Mesophase-Forming ABC and ACB Triblock Copolymers with Fluorinated B Blocks Molecular Crystals and Liquid Crystals (2005), 441(1), 211-226.

*Kim, Kyung-Min; Ayothi, Ramakrishnan; Ober, Christopher K. Synthesis, Characterization and Lithography Performance of Photoacid Generator with Short Perfluoroalkyl Anion Polymer Bulletin (Heidelberg, Germany) (2005), 55(5), 333-340.

*Kousuke Tsuchiya, Seung Wook Chang, Nelson M. Felix, Mitsuru Ueda and Christopher K. Ober, Lithography Based on Molecular Glasses, J. Photopolym. Sci. Tech., 18 (3): 431-434 2005.

*Young-Je Kwark, J. Pablo Bravo-Vasquez, Heidi B. Cao, Hai Deng, and Christopher K. Ober, Silicon Containing Organic-Inorganic Hybrid Materials as EUV Photoresists, J. Photopolym. Sci. Tech., 18 (4): 481-487 2005.

Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton, Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo, Christopher K. Ober, Heidi B. Cao and Hai Deng, Materials for Future Lithography, Proceedings of SPIE, 5753 1 (2005).

Ober, Christopher K.; Senaratne, Wageesha; Sengupta, Prabuddha; Baird, Barbara. Patterned structures for study of cell-surface interactions. PMSE Preprints (2005), 93 252-253.

Krishnan, Sitaraman; Finlay, John A.; Hexemer, Alexander; Wang, Nick; Ober, Christopher K.; Kramer, Edward J.; Callow, Maureen E.; Callow, James A.; Fischer, Daniel. Interaction of ulva and navicula marine algae with surfaces of pyridinium polymers with fluorinated side-chains. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 1248-1249.

Lin, Qin; Krishnan, Sitaraman; Paik, Marvin; Busch, Peter; Ober, Christopher K.; Hexemer, Alexander; Sohn, Karen E.; Kramer, Edward J.; Kowalke, Greg L.; Wendt, Dean E. Semifluorinated triblock copolymers as surface active components for multilayer marine antifouling coatings. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 635-636.

Krishnan, Sitaraman; Ober, Christopher K.; Ayothi, Ramakrishnan; Lin, Qin; Paik, Marvin; Hexemer, Alexander; Kramer, Edward J.; Fischer, Daniel. Hydrophobic and hydrophilic fluoropolymers as non-adhesive interfaces in marine biofouling. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 613-614.

Ober, Christopher K.; You, Fengxiang; Li, Mingqi; Chao, Chiyang; Du, Phong; Wiesner, Ulrich. Chemical strategies for control of phase structure in block copolymers. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 538.

Ober, Christopher K.; Senaratne, Wageesha; Sengupta, Prabuddha; Baird, Barbara. Patterned structures for study of cell-surface interactions. PMSE Preprints (2005), 93 252-253.

Krishnan, Sitaraman; Finlay, John A.; Hexemer, Alexander; Wang, Nick; Ober, Christopher K.; Kramer, Edward J.; Callow, Maureen E.; Callow, James A.; Fischer, Daniel. Interaction of ulva and navicula marine algae with surfaces of pyridinium polymers with fluorinated side-chains. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 1248-1249.

Lin, Qin; Krishnan, Sitaraman; Paik, Marvin; Busch, Peter; Ober, Christopher K.; Hexemer, Alexander; Sohn, Karen E.; Kramer, Edward J.; Kowalke, Greg L.; Wendt, Dean E. Semifluorinated triblock copolymers as surface active components for multilayer marine antifouling coatings. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 635-636.

Krishnan, Sitaraman; Ober, Christopher K.; Ayothi, Ramakrishnan; Lin, Qin; Paik, Marvin; Hexemer, Alexander; Kramer, Edward J.; Fischer, Daniel. Hydrophobic and hydrophilic fluoropolymers as non-adhesive interfaces in marine biofouling. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 613-614.

Ober, Christopher K.; You, Fengxiang; Li, Mingqi; Chao, Chiyang; Du, Phong; Wiesner, Ulrich. Chemical strategies for control of phase structure in block copolymers. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2005), 46(2), 538.

*Wageesha Senaratne, Cindy Harnett, Prabuddha Sengupta, Barbara Baird, Harold Craighead, Christopher K. Ober Molecular Templates for Bio-specific Recognition by Low-Energy Electron Beam Lithography, Nanobiotechnology, 2005, 1(1), 23-34.

*Mingqi Li, Christopher Coenjarts and Christopher K. Ober, Patternable Block Copolymers, Advances in Polymer Science, in press.

*Tianyue Yu, Qing Wang, Daniel S. Johnson, Michelle D. Wang and Christopher K. Ober, Functional Hydrogel Surfaces: Binding Kinesin Based Molecular Motor Proteins, Adv. Functional Materials, 2005, 15, 1303-1309.

*W. Senaratne, Luisa Andruzzi and Christopher K. Ober, Self-Assembled Monolayers and Polymer Brushes in Biotechnology: Current Applications and Future Perspectives, Biomacromolecules, 2005, 6, 2427-2448.

*Paik, Hyun-Jong; Kim, Young-Rok; Orth, Reid N.; Ober, Christopher K.; Coates, Geoffrey W.; Batt, Carl A. End-functionalization of poly(3-hydroxybutyrate) via genetic engineering for solid surface modification. Chemical Communications (Cambridge, United Kingdom) (2005), (15), 1956-1958.

Chang, Seung Wook; Felix, Nelson; Yang, Da; Ramakrishnan, Ayothi; Ober, Christopher K. Lithography based on calix[4]resorcinarene and related molecular glasses. Polymeric Materials: Science and Engineering (2005), 92 131-132.

Yang, Da; Dai, Junyan; Li, Mingqi; Ober, Christopher K. The convergence of top-down and bottom-up nanofabrication: formation of 3D structures. Proceedings of SPIE-The International Society for Optical Engineering (2005), 5592(Nanofabrication: Technologies, Devices, and Applications), 12-26.

*Luisa Andruzzi, Wageesha Senaratne, Alexander Hexemer, Erin D. Sheets, B. Ilic, David Holowka, Edward J. Kramer, Barbara Baird, and Christopher K. Ober Exploring the Potential of Oligoethylene Glycol Containing Polymer Brushes as Bio-selective Surfaces, Langmuir, 2005, 21, 2495-2504.

2004

Goto, Takeshi; Li, Mingqi; Ober, Christopher. Patternable block copolymers: from synthesis to application. Uchu Kozo, Zairyo Shinpojumu (2005), Volume Date 2004, 20th 1-5.

Galli, G.; Ragnoli, M.; Bertolucci, M.; Ober, C. K.; Kramer, E. J.; Chiellini, E. Fluorinated 2-vinylcyclopropane copolymers as low surface energy materials. Macromolecular Symposia (2004), 218(Current Topics in Polymer Science and Technology), 303-312.

*C. Coenjarts and C. K. Ober, Three Dimensional 2-Photon Microfabrication of Silicone Elastomers, Chem. Mater, (Communication); 2004 16(26); 5556-5558.

*Chinedum Osuji, Paulo J. Ferreira, Guoping Mao, Christopher K. Ober, John B. Vander Sande, Edwin L. Thomas, Alignment of Self-Assembled Hierarchical Microstructure in Liquid Crystalline Diblock Copolymers Using High Magnetic Fields, Macromolecules, 2004 37(26); 9903-9908.

*Mao, Yu; Felix, Nelson M.; Nguyen, Peter T.; Ober, Christopher K.; Gleason, Karen K. Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor deposition. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures--Processing, Measurement, and Phenomena (2004), 22(5), 2473-2478.

Young-Je Kwark, J. Pablo Bravo-Vasquez, and Christopher K. Ober, Heidi B. Cao, Hai Deng, and Robert Meagley, Silicon-based Resists for EUV Lithography, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 25 (2004).

V. Jakubek, C. K. Ober, E. Robertson III, T. J. Markely, A. Abdourasak and J. A. Marsella, Hexafluoro- and Trifluoromethyl Carbinols in 157-nm Photoresists, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 71 (2004).

Alyssandrea H. Hamad, Frank Houlihan, Larry Seger, Chun Chang, Christopher K. Ober^,The Role of Small Molecules As Fluorinated Dissolution Inhibitors, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 83 (2004).

E. Robertson III, T. J. Markely, A. Abdourasak, V. Jakubek, C. K. Ober, Transparency and Etch Resistance of Several Polymers Derived from Trifluoroacetone, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 101 (2004).

Junyan Dai, Christopher K Ober, Sang Ouk Kim, Paul Nealey, Victoria Golovkina, Jangho Shin, Lin Wang, Franco Cerrina, Synthesis and Evaluation of Novel Organoelement Resists for EUV Lithography, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 109 (2004).

Yu Mao, K.K. Gleason, P.T. Nguyen, N. Felix, C. K. Ober, Chemical Vapor Deposition of Polymeric Thin Films Combined with Supercritical CO₂ Development for Dry Lithography, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 187 (2004).

Victor Q. Pham, Nelson M. Felix, Vladimir Jakubek, Jessie Mao, Karen Gleason, Christopher K. Ober, New Photoresists and Processing Methods for Supercritical Carbon Dioxide Development, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 281 (2004).

Tianyue Yu, Christopher K. Ober, Stephan M. Kuebler, Wenhui Zhou, Seth R. Marder and Joseph W. Perry, Three-dimensional Microfabrication in Chemically Amplified Positive Resists by Two-Photon Lithography, Advances in Imaging and Materials Processes, SPE Proceedings, H. Ito, R. Varanasi, M. Khojasteh and R. Chen, eds., 307 (2004).

*Birger Lange, Rudolf Zentel, Christopher Ober, Seth Marder, Photo-processable polymer opals, Chem. Mater., (2004), 16(25), 5286-5292.

*Sitaraman Krishnan, Young J. Kwark, Christopher K. Ober, Fluoropolymers: Liquid Crystalline Properties, and Applications in Lithography, Chemical Record, 4(5), 315-330 (2004).

*Bae, Young C.; Ober, Christopher K. Patternable block copolymers with high transparency at 157 nm: Fluorocarbinol functionalized poly(isoprene-b-cyclohexane). Polymer Bulletin (Heidelberg, Germany) (2004), 52(5), 321-328.

*Luisa Andruzzi, Alexander Hexemer, Xuefa Li, Christopher K. Ober, Edward J. Kramer, Giancarlo Galli, Emo Chiellini, Daniel A. Fischer, "Control of Surface Properties Using Fluorinated Polymer Brushes Produced by Surface-Initiated Controlled Radical Polymerization", Langmuir, (2004), 20(24), 10498-10506.

Rudolf Zentel and Christopher K. Ober, "Tribute to Helmut Ringsdorf", Macromolecules, (2004), 37(23), 8485-8486.

Senaratne, Wageesha; Sengupta, Prabuddha; Jakubek, Vladimir; Baird, Barbara; Ober, Christopher K. "Biomolecular patterned surfaces by electron beam lithography", Polymeric Materials: Science and Engineering (2004), 91 361-362.

Kuebler, Stephen M.; Braun, Kevin L.; Stellacci, Francesco; Bauer, Christina A.; Halik, Marcus; Zhou, Wenhui; Yu, Tianyue; Ober, Christopher K.; Marder, Seth R.; Perry, Joseph W. "Two-photon 3D lithography: Materials and applications", Polymeric Materials: Science and Engineering (2004), 91 342-343.

Krishnan, Sitaraman; Ober, Christopher K.; Lee, Kristen L.; Angert, Esther R.; Hexemer, Alexander; Kramer, Edward J. "Antibacterial coatings based on quaternized poly(4-vinylpyridine) block copolymers", Polymeric Materials: Science and Engineering (2004), 91 814-815.

Galli, G.; Andruzzi, L.; Chiellini, E.; Li, X.; Ober, C. K.; Hexemer, A.; Kramer, E. J. "Structural organisation in polystyrene-based semifluorinated block copolymers for low surface energy coatings". Surface Coatings International, Part B: Coatings Transactions (2004), 87(B2), 77-82.

Ober, Christopher K.; Douki, Katsuji; Bae, Young C.; Dai, Junyan; Conley, Will. "The photopolymer science and technology award", Journal of Photopolymer Science and Technology (2004), 17(1), 7-10.

Murakami, Yasuharu; Coenjarts, Christopher A.; Ober, Christopher K. "Preparation and two-photon lithography of a sulfur containing resin with high refractive index", Journal of Photopolymer Science and Technology (2004), 17(1), 115-118.

J. Pablo Bravo-Vasquez, Young-Je Kwark, and Christopher K. Ober, Heidi B. Cao, Hai Deng, and Robert Meagley, "Silicon Backbone Polymers as EUV Resists", SPIE Proceedings, Proceedings of SPIE-The International Society for Optical Engineering (2004), 5376 (Pt. 2, Advances in Resist Technology and Processing XXI), 739-745.

Vladimir Jakubek, Eric A. Robertson III, Atteye H. Abdourazak, Thomas J. Markley, John A. Marsella, Christopher K. Ober, "Hexafluoroisopropyl and Trifluoromethyl Carbinols in an Acrylate Platform for 157-nm Chemically Amplified Resists", Proceedings of SPIE-The International Society for Optical Engineering (2004), 5376(Pt. 1, Advances in Resist Technology and Processing XXI), 554-564

Junyan Dai, Christopher K. Ober, "Novel Resists with Non-traditional Compositions for EUV Lithography", Proceedings of SPIE-The International Society for Optical Engineering, 2004), 5376(Pt. 1, Advances in Resist Technology and Processing XXI),508-516.

*Kempe, Michael D.; Kornfield, Julia A.; Ober, Christopher K.; Smith, Steven D."Synthesis and Phase Behavior of Side-Group Liquid Crystalline Polymers in Nematic Solvents", Macromolecules(2004), 37(10), 3569-3575.

*Z. S. Zhang, O.M. Wilson, M. Y. Efremov, E. A. Olson, M. Zhang, P. V. Braun, C. Ober, W. Senaratne, M. Zhang & L. H. Allen, "Heat Capacity Measurements of Two-Dimensional Self-Assembled Monolayers On Polycrystalline Gold", Appl. Phys. Lett. v84 p5198 (2004).

Chi-Yang Chao, Xuefa Li and Christopher K. Ober, "Directing Self-assembly in Macromolecular Systems: Hydrogen Bonding in Ordered Polymers", Pure and Applied Chemistry, 76(7-8), 1337-1343, 2004.

*Victor Q. Pham, Nagesh Rao, Christopher K. Ober, "Swelling and dissolution rate measurements of polymer thin films in supercritical carbon dioxide", J. Supercritical Fluids, (2004), 31(3), 323-328.

*Mingqi Li, Katsuji Douki, Ken Goto, Xuefa Li, Detlef M. Smilgies and Christopher K. Ober, "Spatially Controlled Fabrication of Nanoporous Block Copolymers", Chem. Mater., (2004), 16(20), 3800-3808.

*J. Paik. C. Batt, G. Coates, C. K. Ober, "Enzymatic surface-initiated polymerization: A novel approach for the in situ solid phase synthesis of the biocompatible polymer, poly[3-hydroxybutyrate]", Biomacromolecules, 2004, 5, 889.

*Phong Du, Xuefa Li, Katsu Doki, Mingqi Li, Sol Gruner, Detlef Smilgies, Uli Wiesner and Christopher Ober, "Phase Selective Chemistry in Block Copolymer Thin Films", Adv. Mater., 16(12), 953 - 957 (2004).

*B. Ilic, H. G. Craighead, S. Krylov, W. Senaratne, C. Ober and P. Neuzil, "Attogram detection using Nanoelectromechanical Oscillators", J. Appl. Phys., 95, 3694 (2004)

*Chi-Yang Chao, Xuefa Li, Christopher K. Ober and Edwin L. Thomas, "Orientation in Hydrogen-bonded Side Chain Liquid Crystalline Block Copolymers using Applied AC Electric Fields", Advanced Functional Materials, 14(4), 364-370 (2004).

*Kuebler,Stephen M.; Perry, Joseph W.; Marder, Seth R.; Ober, Christopher K.; Braun, Kevin L.; Yu, Tianyue; Zhou, Wenhui. "High-sensitivity material systems for two-photon three dimensional microfabrication." Proceedings of SPIE-The International Society for Optical Engineering (2004), 5347 (Micromachining Technology for Micro-Optics and Nano-Optics II),111-117.

*Markley, T. J.; Marsella, J. A.; Robertson, E. A., III; Parris, G. E.; Zarkov, Z.; Jakubek, V.; Ober, C. K."Wetting and dissolution studies of fluoropolymers used in 157 nm photolithography applications", Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures--Processing, Measurement, and Phenomena (2004), 22(1), 140-145.

*A. Hexemer, E. Sivaniah, E. J. Kramer, M. Xiang, X. Li and C. K. Ober, "Managing Polymer Surface Structure Using Surface Active Block Copolymers (SABC) in Block Copolymer Mixures", Journal of Polymer Science Part B: Polymer Physics, 42(3), 2004, 411-420.

*J.- S. Chen, C. K. Ober, M. D. Poliks, Y. Zhang, U. Wiesner, C. Cohen, "Controlled Degradation of Epoxy Networks: Analysis of Crosslink Density and Glass Transition Temperature Changes in Thermally Reworkable Thermosets", Polymer, 2004, 45/6, 1939-195.

2003

Galli, Giancarlo; Andruzzi, L.; Chiellini, E.; Li, X.; Ober, C. K.; Hexemer, A.; Kramer, E. J., "Bulk and surface structures of polystyrene-based semifluorinated block copolymers for low surface energy coatings", Fluorine in Coatings V, Conference Papers, 5th, Orlando, FL, United States, Jan. 21-22, 2003 (2003),Paper4/B, Paper4/1-Paper4/10.

*Victor Q. Pham, Robert J. Ferris, Alyssandrea Hamad, Christopher K. Ober, "Positive-tone photoresist process for supercritical carbon dioxide development", Chem. Mater., 2003 15 (26); 4893-4895.

*Vohra, Vaishali R.; Schmidt, Daniel F.; Ober, Christopher K.; Giannelis, Emmanuel P. "Deintercalation of a chemically switchable polymer from a layered silicate nanocomposite.", Journal of Polymer Science, Part B: Polymer Physics (2003), 41(24), 3151-3159.

Bizzarri, Ranieri; Chiellini, Federica; Ober, Christopher K.; Saltzman, W. Mark; Solaro, Roberto; Chiellini, Emo."Malolactonate polymers and copolymers for biomedical applications."Macromolecular Symposia" (2003), 197(7th World Conference on Biodegradable Polymers & Plastics, 2002), 303-314.

Chiellini, Federica; Bizzarri, Ranieri; Ober, Christopher K.; Schmaljiohann, Dirk; Yu, Tianyue; Saltzman, W. Mark; Solaro, Roberto; Chiellini, Emo."Surface patterning and biological evaluation of semi-interpenetrated poly(HEMA)/poly(alkyl-b-malolactonate)s." Macromolecular Symposia (2003), 197(7th World Conference on Biodegradable Polymers & Plastics, 2002), 369-379.

Ober, Christopher K.; Senaratne, Wageesha; Andruzzi, Luisa. "Patterned surfaces through polymer brushes." Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2003), 44(2), 228-229.

Thomas, Edwin L.; Osuji, Chinedum; Bita, Ion; Chao, Chi-Yang; Ober, Christopher K. "Self-assembled hydrogen bonded liquid-crystalline diblock copolymers as tunable 1-D photonic crystals", Polymeric Materials Science and Engineering (2003), 89 86-87.

*Phong Du, Xuefa Li, Katsu Doki, Mingqi Li, Sol Gruner, Detlef Smilgies, Uli Wiesner and Christopher Ober, "Phase Selective Chemistry in Block Copolymer Thin Films", Adv. Mater., submitted.

*Victor Q. Pham, Nagesh Rao, Christopher K. Ober, "Swelling and dissolution rate measurements of polymer thin films in supercritical carbon dioxide", J. Supercritical Fluids, in press.

*Padma Gopalan, Xuefa Li,Mingqi Li,Christopher K. Ober, Chad P. Gonzales, and Craig J. Hawker, "Rod-Coil Block Copolymers: An Iterative Synthetic Approach via Living Free Radical Procedures", Journal of Polymer Science, Part A: Polymer Chemistry (2003), 41(22), 3640-3656.

Hamad, Alyssandrea H.; Houlihan, Francis M.; Seger, Larry; Chang, Chun; Ober, Christopher K."Evaluation of fluorinated dissolution inhibitors for 157-nm lithography." Proceedings of SPIE-The International Society for Optical Engineering (2003), 5039(Pt. 1), 558-568.

Vohra, Vaishali R.; Liu, Xiang-Qian; Douki, Katsuji; Ober, Christopher K.; Conley, Will; Zimmerman, Paul; Miller, Daniel. "Fluoropolymer resists for 157 nm lithography." Proceedings of SPIE-The International Society for Optical Engineering (2003), 5039(Pt. 1), 539-547.

Kwark, Young-Je; Bravo-Vasquez, Juan-Pablo; Ober, Christopher K.; Cao, Heidi B.; Deng, Hai; Meagley, Robert P. "Novel silicon-containing polymers as photoresist materials for EUV lithography." Proceedings of SPIE-The International Society for Optical Engineering (2003), 5039 1204-1211.

Dai, Junyan; Ober, Christopher K.; Kim, Sang-Ouk; Nealey, Paul F.; Golovkina, Victoria; Shin, Jangho; Wang, Lin; Cerrina, Franco. Synthesis and evaluation of novel organoelement resists for EUV lithography. Proceedings of SPIE-The International Society for Optical Engineering (2003), 5039 1164-1172.

Ober, Christopher K.; Youngblood, Jeffrey P.; Andruzzi, Luisa; Senaratne, Wageesha; Li, Xuefa; Hexemer, Alexander; Kramer, Edward J. "Block copolymers as surface modifiers: Synthesis, characterization and relevance to fouling release and biostability." Polymeric Materials Science and Engineering (2003), 88 612-613.

Youngblood, Jeffrey P.; Andruzzi, Luisa; Senaratne, Wageesha; Ober, Christopher K.; Callow, Jim A.; Finlay, John A.; Callow, Maureen E. "New materials for marine biofouling resistance and release: Semi-fluorinated and PEGylated block copolymer bilayer coatings." Polymeric Materials Science and Engineering (2003), 88 608-609.

Andruzzi, Luisa; Senaratne, Wageesha; Hexemer, Alexander; Ober, Christopher K.; Kramer, Edward J."PEG-based biostable surfaces by controlled radical polymerization". Polymeric Materials Science and Engineering (2003), 88 604-605.

Senaratne, Wageesha; Andruzzi, Luisa; Sheets, Erin D.; Holowka, David; Ilic, Bojan; Hexemer, Alexander; Baird, Barbara; Kramer, Edward J.; Ober, Christopher K.Ober "Exploring the potential of surface grown PEG-polymer brushes for biotechnology applications.", Polymeric Materials Science and Engineering (2003), 88 337-338.

*Victor Q. Pham, Robert J. Ferris, Alyssandrea Hamad, Christopher K. Ober, "Positive-tone photoresist process for supercritical carbon dioxide development", Chem. Mater., in press.

*A. Hexemer, E. Sivaniah, E. J. Kramer, M. Xiang, X. Li and C. K. Ober, "Managing Polymer Surface Structure Using Surface Active Block Copolymers (SABC) in Block Copolymer Mixtures", J. Polym. Sci: Polym. Phys., in press.

*Tianyue Yu and Christopher K. Ober, "Methods For The Topographical Patterning and Patterned Surface Modification Of Hydrogels Based On Hydroxyethyl Methacrylate", Biomacromolecules, (2003), 4(5), 1126-1131.

*Christopher K. Ober, Mingqi Li, Katsuji Douki, Ken Goto, Xuefa Li, "Lithographic Patterning with Block Copolymers", J. Photopolym. Sci. Tech., 16(3), 347-350 (2003).

*V. Jakubek, X. Liu, V. R. Vohra, K. Douki, Y. Kwark, Christopher K. Ober, T. J. Markley, E. A. Robertson III, R. V. C. Carr, J. A. Marsella, W. Conley, D. Miller, and P. Zimmerman, "Strategies for High Transparency Acrylate Resists for 157 nm Lithography", J. Photopolym. Sci. Tech., 16(4), 573-580 (2003).

*Stephen M. Kuebler, Kevin L. Braun, Wenhui Zhou, J. Kevin Cammack, Tianyue Yu, Christopher K. Ober, Seth R. Marder, Joseph W. Perry, "Design and application of high-sensitivity two-photon initiators for three-dimensional microfabrication", Journal of Photochemistry and Photobiology A: Chemistry 158 (2003) 163-170.

*Jeffrey P. Youngblood, Luisa Andruzzi, Christopher K. Ober, Alexander Hexemer, Edward J. Kramer, James A. Callow, John A. Finlay and Maureen E. Callow, "Coatings from Side-Chain Ether-Linked Poly(Ethylene Glycol) and Fluorocarbon Polymers For The Control Of Marine Biofouling", Biofouling, 19,91-98 (2003).

*Padma Gopalan, Yuanming Zhang, Xuefa Li, Ulrich Weisner, Christopher K. Ober, "Liquid Crystalline Rod-Coil Block Copolymers By Stable Free Radical Polymerization: Synthesis, Morphology and Rheology", Macromolecules, (2003), 36(9), 3357-3364.

*Hilmar Koerner, Yixia Luo, Xuefa Li, Claude Cohen, Ronald C. Hedden and C. K. Ober, "Structural Studies of Extension-Induced Mesophase Formation in Poly(diethylsiloxane) Elastomers: In Situ Synchrotron WAXS and SAXS", Macromolecules, (2003), 36(6), 1975-1981.

*Tianyue Yu, Christopher K. Ober, Stephan M. Kuebler, Wenhui Zhou, Seth R. Marder and Joseph W. Perry, "Three-dimensional Microfabrication in a Chemically Amplified Positive System using 2-Photon Lithography", Adv. Mater., 15(6), 2003, 517-521.

2002

*Weibel, Gina L.; Ober, Christopher K. "An overview of supercritical CO₂ applications in microelectronics processing" Microelectronic Engineering (2002), 65(1-2), 145-152.

*Chinedum Osuji, Chi-Yang Chao, Ion Bita, Christopher K. Ober, Edwin L. Thomas, "Temperature Dependent Photonic Band Gap in a Self-Assembled Hydrogen Bonded Liquid Crystalline Diblock Copolymer", Adv. Functional Mater., 12, 753-758 (2002).

Yu, Tianyue; Chiellini, Federica; Schmaljohan, Dirk; Solaro, Roberto; Ober, Christopher Kemper. Microfabrication of hydrogels for biomedical applications. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 854-860.

Hamad, Alyssandrea H.; Bae, Young C.; Liu, Xiang-Qian; Ober, Christopher Kemper; Houlihan, Francis M.; Dabbagh, Gary; Novembre, Anthony E. Fluorinated dissolution inhibitors for 157-nm lithography. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 477-485.

Pham, Victor Quan; Weibel, Gina L.; Rao, Nagesh G.; Ober, Christopher Kemper. Dissolution rate measurements for resist processing in supercritical carbon dioxide. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 425-431.

Vohra, Vaishali Raghu; Douki, Katsuji; Kwark, Young-Je; Liu, Xiang-Qian; Ober, Christopher Kemper; Bae, Young C.; Conley, Will; Miller, Daniel; Zimmerman, Paul. Highly transparent resist platforms for 157-nm microlithography: an update. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 84-93.

Huang, Wu-Song; Kwong, Ranee W.; Moreau, Wayne M.; Lang, Robert; Medeiros, David R.; Petrillo, Karen E.; Mahorowala, Arpan P.; Angelopoulos, Marie; Lin, Qinghuang; Dai, Junyan; Ober, Christopher Kemper. Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 432-441

Dai, Junyan; Ober, Christopher Kemper; Wang, Lin; Cerrina, Franco; Nealey, Paul F. Organoelement resists for EUV lithography. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 1193-1202.

*Xuefa Li, Luisa Andruzzi, E. Chiellini, G. Galli, Christopher K. Ober, Alexander Hexemer, Edward J. Kramer, Daniel A. Fischer, "Semifluorinated Aromatic Side-Group Polystyrene-Based Block Copolymers: Bulk Structure and Surface Orientation Studies", Macromolecules, (2002), 35(21), 8078-8087.

*J.-S. Chen, M. D. Poliks, C. K. Ober, Y. Zhang, U. Wiesner, E. Giannelis, "Study of the Exfoliation Mechanism and Thermal-mechanical Properties of Surface-initiated Epoxy Nanocomposites", Polymer, (2002), 43(18), 4895-4904.

*Gopalan, Padma; Andruzzi, Luisa; Li, Xuefa; Ober, Christopher K., "Fluorinated mesogen-jacketed liquid-crystalline polymers as surface-modifying agents: design, synthesis and characterization", Macromolecular Chemistry and Physics (2002), 203(10/11), 1573-1583.

*Bizzarri, Ranieri; Chiellini, Federica; Ober, Chris K.; Saltzman, W. Mark; Solaro, Roberto, "Influence of structural parameters on the ring-opening polymerization of new alkyl malolactonate monomers and on the biocompatibility of polymers therefrom", Macromolecular Chemistry and Physics (2002), 203(10/11), 1684-1693.

Victor Q. Pham, Peter T. Nguyen, Gina L. Weibel, Robert J. Ferris, Christopher K. Ober, "Positive-Tone Resist For Supercritical CO2 Processing", Polymer Preprints, (2002), 43(2), 885-886.

Luisa Andruzzi, Alexander Hexemer, Xuefa Li, Christopher K. Ober, Edward J. Kramer, Giancarlo Galli, Emo Chiellini, "Surface Control Using Polymer Brushes Produced By Controlled Radical Polymerization", Polymer Preprints, (2002), 43(2), 76-77.

Padma Gopalan, Xuefa Li, Christopher K. Ober, Craig Hawker , "Synthesis Of Rod -Coil Diblock Copolymers Via Nitroxide Functionalized Mesogenic Rod Segments", Polymer Preprints, (2002), 43(2), 110-111.

Tianyue Yu, Christopher K. Ober, Stephen M. Kuebler, Wenhui Zhou, Seth R. Marder, and Joseph W. Perry, "Two-photon Positive Tone Lithography for Three-dimensional Microfabrication", Polymeric Materials: Science and Engineering (2002), 87 411.

*L. Andruzzi, E. Chiellini, G. Galli, X. Li, S. Kang, C. K. Ober, "Engineering Low Surface Energy Polymers through Molecular Design: Synthetic Routes to Fluorinated Polystyrene-Based Block Copolymers", J. Mater. Chem., (2002), 12(6), 1684-1692.

Kim, Young-Rok; Paik, Hyun-Jong; Ober, Christopher K.; Coates, Geoffrey W.; Batt, Carl A. Enzymatic surface-initiated polymerization of 3-(R)-hydroxybutyryl-coenzyme A: Surface modification of a solid substrate with a biodegradable and biocompatible polymer: poly(3-hydroxybutyrate). Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2002), 43(1), 706-707.

Kwark, Young-Je; Douki, Katsuji; Vohra, Vaishali; Liu, Xiangqian; Conley, Wil; Zimmermann, Paul; Ober, Christopher K. Tetrafluorophenols: New functional structures for 157 nm lithography. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2002), 43(1), 480-481.

Chao, Chiyang; Ober, Christopher K.; Osuji, Chinedum; Thomas, Edwin L. Hydrogen-bonded side-chain liquid crystalline block copolymers for photonic bandgap materials. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) (2002), 43(1), 13-14.

*Ober, Christopher K.; Douki, Katsuji; Vohra, Vaishali R.; Kwark, Young-Je; Liu, Xiang-Qian; Conley, Will; Miller, Daniel; Zimmerman, Paul. New strategies for high resolution photoresists. Journal of Photopolymer Science and Technology (2002), 15(4), 603-611.

*Wenhui Zhou, Stephen M. Kuebler, Kevin L. Braun, Tianyue Yu, J. Kevin Cammack, Christopher K. Ober, Joseph W. Perry, Seth R. Marder, "An Efficient Two-Photon Photoacid and Its Application to 3D Microfabrication In Positive-Tone Resists", Science, 296, 1106 -1109 (2002).

*C. K. Ober, "Perspectives: Self-assembly: Persistence Pays Off", Science, 296, 859 (2002).

*Y. C. Bae*, K. Douki, T. Yu, J. Dai, D. Schmaljohann, H. Koerner, C. K. Ober*, W. Conley, "Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones", Chem Mater., (2002), 14(3), 1306-1313.

*G. Weibel and C. K. Ober, "Processing Polymers in Supercritical CO2", in Encyclopedia of Materials: Science and Technology, K. Buschow, R. W. Cahn, M. C. Flemins, B. Ilschner, E. J. Kramer and S. Mahajan, eds, supplement, Elsevier, New York (2002)

*Chen, J.-S.; Ober, C. K.; Poliks, M. D. "Characterization Of Thermally Reworkable Thermosets: Materials For Environmentally Friendly Processing and Reuse" Polymer (2002), 43(1), 131-139.

2001

Yu, Tianyue; Ching, Philip; Ober, Christopher K.; Deshpande, Shreeram; Puligadda, Rama. "Development of a bond contribution model for structure: property correlations in dry etch studies" Proc. SPIE-Int. Soc. Opt. Eng. (2001), 4345(Pt. 2, Advances in Resist Technology and Processing XVIII), 945-951.

*Chiellini, F.; Bizzarri, R.; Ober, C. K.; Schmaljohann, D.; Yu, T.; Solaro, R.; Chiellini, E. "Patterning Of Polymeric Hydrogels For Biomedical Applications" Macromol. Rapid Commun. (2001), 22(15), 1284-1287.

*C. K. Ober and G. Mao, "Liquid Crystalline Block Copolymers", in Encyclopedia of Materials: Science and Technology, K. Buschow, R. W. Cahn, M. C. Flemins, B. Ilschner, E. J. Kramer and S. Mahajan, eds, T. Lodge volume editor, Elsevier, New York (2001).

Bae, Y. C.; Ober, C. K. "Fluorocarbinol-containing acrylic (co)polymers with high transparency at 157 nm." Polym. Prepr. (Am. Chem. Soc., Div. Polym. Chem.) (2001), 42(2), 403-404.

*Y. C. Bae, K. Douki, T. Yu, J. Dai, D. Schmaljohann, S. Kang, K. Kim, H. Koerner, W. Conley, D. Miller, R. Balasubramanian, S. Holl, and C. K. Ober, "Rejuvenation of 248 nm Resist Backbones in 157 nm Lithography, J. Photopolym. Sci. Tech. (2001), 14(4), 613-620.

*Chen, J.-S.; Ober, C. K.; Poliks, M. D. "Characterization of thermally reworkable thermosets: materials for environmentally friendly processing and reuse" Polymer (2002), 43(1), 131-139.

*H. G. Pryce Lewis, G. L. Weibel, C. K. Ober and K. K. Gleason, "Supercritical carbon dioxide as the development medium for patterning fluorocarbon films", Chem. Vap. Deposition, 7, 195-197 (2001).

*Kazutake Takada, Padma Gopalan, Christopher K. Ober and Hector D. Abruña, "Synthesis, Characterization and Redox Reactivity of Novel Quinone Containing Polymers", Chem. Materials, 2001; 13(9); 2928-2932.

*D. Diaz, J. E. Hudson, G. D. Storrier, H. D Abruña, N. Sundararajan and C. K. Ober, "Lithographic Applications of Redox Probe Microscopy", Langmuir (2001), 17(19), 5932-5938.

*P. Gopalan and C. K. Ober, "Highly Reactive 2,5 -Disubstituted Styrene Based Monomer Polymerized via Stable Free Radical Polymerization: Effect of Substitution and Liquid Crystallinity on Polymerization", Macromolecules (2001), 34(15), 5120-5124.

*E. Sivaniah, J. Genzer, G. H. Fredrickson, E. J. Kramer, M. Xiang, X. Li, C. K. Ober and S. Maganov, "Periodic Surface Topology of Three-Arm Semifluorinated Alkane Monodendron Diblock Copolymers", Langmuir, (2001), 17(14), 4342-4346.

*T. Koga and S. Zhou, B. Chu, J. L. Fulton, S. Yang, C. K. Ober and B. Erman, "New High Pressure Cell for Simultaneous Synchrotron Small-Angle X-ray Scattering and Laser Light Scattering Measurements", Rev. Sci. Instrum., 72(6), 2679-2685 (2001).

*R. H. Colby, L.M.Nentwich, S.R.Clingman and C. K. Ober, "Defect-mediated Creep Of Structured Materials", Europhys.Lett., 54(2), 269 -74 (2001)

Xuefa Li, Yushi Ando, Christopher K. Ober, Easan Sivaniah, Edward J. Kramer, and Dan Fisher, "Surface Self-Assembly in Side Chain Modified Block Copolymers", PMSE Preprints, 84 870 (2001).

M. Li, X. Li and C. K. Ober, "Conducting Block Copolymers with Novel Architectures: Synthesis and Characterization", PMSE Preprints, 84 715 (2001).

Doris U. Pospiech, Dieter E. Jehnichen, Antje Gottwald, Liane Häussler, Ulrich Scheler, Peter Friedel, Wolfram Kollig, Christopher K. Ober, Xuefa Li, Alexander Hexemer, Edward J. Kramer, Daniel A. Fischer, "Investigation Of The Microphase Separation In Semifluorinated Polyesters", PMSE Preprints, 84 314 (2001).

Seok Ho Kang, Maoliang Xiang, Xuefa Li, Federica Chiellini, Christopher K. Ober, Edward J. Kramer, "Surface Active Block Copolymers (SABC): Biofouling Resistant Coatings From Chemically Modified Polymers", PMSE Preprints, 84 14 (2001).

Victor Q. Pham, Gina L. Weibel, Alyssandrea H. Hamad and Christopher K. Ober, "Processing Fluorinated Photoresists In Supercritical CO2: Environmentally Responsible Processes For The Computer Industry", PMSE Preprints, 84 49 (2001).

2000

*Osuji, C. O.; Chen, J. T.; Mao, G.; Ober, C. K.; Thomas, E. L. "Understanding And Controlling The Morphology Of Styrene-Isoprene Side-Group Liquid Crystalline Diblock Copolymers", Polymer (2000), 41(25), 8897-8907.

*Moriya, K.; Seki, T.; Nakagawa, M.; Mao, G.; Ober, C. K. "Photochromism of 4-Cyanophenylazobenzene in Liquid Crystalline-Coil AB Diblock Copolymers: The Influence of Microstructure." Macromol. Rapid Commun. (2000), 21(18), 1309-1312.

Schmaljohann, D.; Bae, Y.; Weibel, G. L.; Hamad, A. H.; Ober, C. K. "Design Strategies For 157-nm Single-Layer Photoresists: Lithographic Evaluation Of A Poly(a-Trifluoromethyl Vinyl Alcohol) Copolymer." Proc. SPIE-Int. Soc. Opt. Eng. (2000), 3999 (Pt. 1, Advances in Resist Technology and Processing XVII), 330-334.

*T. Hayakawa, J. Wang, N. Sundararajan, M. Xiang, X. Li, B. Glüsen, G. C. Leung, M. Ueda and C. K. Ober, "Photoswitching Surfaces: New Photopatternable, Self-Organizing Fluoropolymers Containing Acid Labile Semifluorinated Groups", J. Phys. Org. Chem. 2000; 13: 787-795.

*T. Hayakawa, J. Wang, M. Xiang, X. Li, M. Ueda, C. K. Ober, J. Genzer, E. Sivaniah, E. J. Kramer, D. A. Fischer, "The Effect of Changing Molecular End Groups on Surface Properties: Synthesis and Characterization of Poly(Styrene-b-Semifluorinated Isoprene) Block Copolymers with -CF₂H End Groups", Macromolecules, (2000) 33(21), 8012-8019.

*J. Genzer, E. Sivaniah, E. J. Kramer, J. Wang, M. Xiang, K. Char, C. K. Ober, R. A. Bubeck, D. A. Fischer, M. Graupe, R. Colorado, Jr., O. E. Shmakova and T. R. Lee, "Molecular orientation of single and 2-armed monodendron semifluorinated chains on "soft" and "hard" surfaces studied using NEXAFS", Macromolecules, 33(16) 6068-6077 (2000).

*M. Xiang, X. Li, C. K. Ober, K. Char, J. Genzer, E. Sivaniah, E. J. Kramer, D. A. Fischer, "Surface Stability in Liquid-Crystalline Block Copolymers with Semifluorinated Monodendron Side Groups", Macromolecules, 33(16) 6106-6119 (2000).

*Bunning, T. J.; Adams, W.; Ober, C. K.; Korner, H.. "Synchrotron Radiation For Probing The Electric Field Alignment Of LC Macromolecules And Polymers." Int. J. Polym. Mater. (2000), 45(3-4), 451-501.

Y. C. Bae, J. Dai, G. L. Weibel and C. K. Ober, "Imageable Polymers Using Fluorocarbinol Containing Polydienes", Polymer Preprints 2000, 41(2), 1586.

X. Li, M. Xiang, C. K. Ober, E. Sivaniah, E. J. Kramer, J. Genzer and D. Fisher, "Surface and Interface Behavior of Semifluorinated Liquid Crystalline Block Copolymers", PMSE Preprints, 83 428 (2000).

P. Gopolan, X. Li, C. K. Ober and C. Hawker, "Stable Free Radical Polymerization of Liquid Crystalline Monomers: Effect of Preordering", PMSE Preprints 2000, 83, 430.

D. Schmaljohann and C. K. Ober, "Investigation on the Copolymerization Behavior of a-Trifluoromethyl vinylacetate", PMSE Preprints 2000, 83, 434.

D. Schmaljohann, A. H. Hamad, G. L. Weibel and C. K. Ober, "Fluorinated Polyvinylalcohols as a Photoresists for 157 nm Lithography", PMSE Preprints 2000, 83, 445.

T. Yu, F. Chiellini, D. Schmaljohann, R. Solaro and C. K. Ober, "Microfabrication Of Hydrogels As Polymer Scaffolds For Tissue Engineering Applications", Polymer Preprints 2000, 41(2), 1699.

J. S. Chen, C. K. Ober, and M. D. Poliks, "Reworkable Thermosets: Enabling Disassembly of Microelectronic Components", Polymer Preprints 2000, 41(2), 1842

G. L. Weibel, H. G. Pryce Lewis, K. K. Gleason and C. K. Ober, "Patternable Fluorocarbon Low-K Dielectrics Developed Using Supercritical CO2", Polymer Preprints 2000, 41(2), 1838.

Seok Ho Kang, C. K. Ober and E. J. Kramer, "Synthesis And Characterization Of Diblock Copolymers Containing Surface Modifying Moieties For Non-Biofouling Materials", Polymer Preprints 2000, 41(2), 1521.

D. Schmaljohann, Y. Bae, J. Dai, G. L. Weibel, A. H. Hamad, and C. K. Ober, "Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography", J. Photopolym. Sci. Technol. (2000), 13(3), 451-458.

*P. Friedel, D. Pospiech, D. Jehnichen, J. Bergmann, C. K. Ober, "Polyesters with Semifluorinated Side Chains: A Proposal for the Solid-State Structure", Journal of Polymer Science: Part B: Polymer Physics, 38, 1617-1625 (2000)

*A. Böker, K. Reihs, J. Wang, R. Stadler and C. K. Ober, "Selectively Thermally Cleavable Fluorinated Side Chain Block Copolymers: Surface Chemistry and Surface Properties", Macromolecules (2000), 33(4), 1310-1320.

Q. Lin, M. Angelopoulos, K. Babich, D. Medeiros, N. Sundararajan, G. Weibel, C. Ober, "Diffusion And Distribution Of Photoacid Generators In Thin Polymer Films", Mater. Res. Soc. Symp. Proc. (2000), 584 (Materials Issues and Modeling for Device Nanofabrication), 155-162.

*Genzer, Jan; Sivaniah, Easan; Kramer, Edward J.; Wang, Jianguo; Koerner, Hilmar; Xiang, Maoliang; Char, Kookheon; Ober, Christopher K.; DeKoven, Benjamin M.; Bubeck, Robert A.; Chaudhury, Manoj K.; Sambasivan, Sharadha; Fischer, Daniel A. "The Orientation of Semifluorinated Alkanes Attached to Polymers at the Surface of Polymer Films." Macromolecules (2000), 33(5), 1882-1887.

*Genzer, Jan; Sivaniah, Easan; Kramer, Edward J.; Wang, Jianguo; Koerner, Hilmar; Char, Kookheon; Ober, Christopher K.; DeKoven, Benjamin M.; Bubeck, Robert A.; Fischer, Daniel A.; Sambasivan, Sharadha. "Temperature Dependence of Molecular Orientation on the Surfaces of Semifluorinated Polymer Thin Films." Langmuir (2000), 16(4), 1993-1997.

*C. Ortiz, L. Belenky, C. K. Ober and E. J. Kramer, "Microdeformation of a Polydomain, Smectic Liquid Crystalline Thermoset", J. Mater. Sci., (2000), 35(8), 2079-2086.

C. K. Ober, "Science Perspective: Shape Persistence of Synthetic Polymers", Science, 2000 April 21; 288: 448-449. (Science Online)

*Dierking, I.; Glusen, B.; Lagerwall, S. T.; Ober, C. K.. "Synchrotron x-ray study of the smectic layer directional instability." Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. (2000), 61(2), 1593-1598.

*N. Sundararajan, S. Yang, J. Wang, K. Ogino, S. Valiyaveettil, C. K. Ober, S. K. Obendorf and R. D. Allen, "Resists Processed in Supercritical CO₂", Chem. Mater., 2000,12,41-48.(Get a reprint)

*S. Yang, J. Wang, K. Ogino, S. Valiyaveettil and C. K. Ober, "Low Surface Energy Fluoromethacrylate Block Copolymers with Patternable Elements", Chem. Mater., 2000, 12, 33-40. (Get a reprint)

*Jeyaprakash, J. D.; Samuel, S.; Dhamodharan, R.; Ober, Christopher K. "A solvent-free method for the synthesis of block copolymers with fluorinated pendant groups by a hydrosilylation reaction." J. Polym. Sci., Part A: Polym. Chem. (2000), 38(7), 1179-1183.

J. S. Chen, C. K. Ober, and M. D. Poliks, "Reworkable Thermosets: the Decomposition Mechanism and Development Network Breakdown of Epoxies with Tertiary Ester Links", Polym. Mater. Sci. Eng. (2000), 82 357-358.

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1999

*J. Genzer, E. Sivaniah, E. J. Kramer, J. Wang, M. Xiang, K. Char, C. K. Ober, R. A. Bubeck, D. A. Fischer, M. Graupe, R. Colorado, Jr., O. E. Shmakova and T. R. Lee, "Molecular Orientation Of Single And 2-Armed Monodendron Semifluorinated Chains On "Soft" And "Hard" Surfaces Studied Using NEXAFS", Macromolecules, in press.

*N. Sundararajan, C. F. Keimel, N. Bhargava, C. K. Ober, J. Opitz, R. D. Allen, G. Barclay, G. Xu, "Ion Beam Analysis in Lithography: Diffusion and Distribution Studies of Photoacid Generators" J. Photopolym. Sci & Tech., 12(3) (1999) 457-468.

L. Crane; A. Torres-Filho; C. K. Ober; S. Yang; J. Chen; R. W. Johnson. " Development of reworkable underfills,materials, reliability and processing." Int. Conf. Adhes. Joining Coat. Technol. Electron. Manuf., Proc. Adhes. '98, 3rd (1998), 262-265. Editor(s): Constable, James H. Publisher: Institute of Electrical and Electronics Engineers, New York, N. Y.

*J. Genzer, E. Sivaniah, E. J. Kramer, J. Wang, H. Körner, K. Char, C. K. Ober, B. DeKoven, R. A. Bubeck and D. A. Fischer, " Temperature Dependence of Molecular Orientation on the Surfaces of Semi-fluorinated Thin Films", Langmuir, in press.

*Osuji, Chinedum; Zhang, Yuanming; Mao, Guoping; Ober, Christopher K.; Thomas, Edwin L. "Transverse Cylindrical Microdomain Orientation in an LC Diblock Copolymer under Oscillatory Shear." Macromolecules (1999), 32(22), 7703-7706.

*S. Pragliola, C. K. Ober, P.Mathers, H. Jeon, "Mesogen-Jacketed Liquid Crystalline Polymers via Stable Free Radical Polymerization", Macromol.Chem.Phys., (1999), 200(10), 2338-2344.

Opitz, Juliann; Allen, Robert D.; Breyta, Gregory; Hofer, Donald C.; Sundararajan, Narayan; Ober, Christopher Kemper. Polymer-platform-dependent characteristics of 193-nm photoresists. Proc. SPIE-Int. Soc. Opt. Eng. (1999), 3678(Pt. 2, Advances in Resist Technology and Processing XVI), 1096-1105.

Sundararajan, Narayan; Ogino, Kenji; Valiyaveettil, Suresh; Wang, Jianguo; Yang, Shu; Kameyama, Atsushi; Ober, Christopher Kemper; Allen, Robert D.; Byers, Jeffrey D. Block copolymers as additives: a route to enhanced resist performance. Proc. SPIE-Int. Soc. Opt. Eng. (1999), 3678(Pt. 1, Advances in Resist Technology and Processing XVI), 78-85.

*M. C. Bignozzi, C. K. Ober, A. J. Novembre and C. Knurek, "Lithographic Results of Electron Beam Photoresists Prepared by Living Free Radical Polymerization", Polym. Bulletin, 43, 93-100 (1999).

Osuji, C. O.; Chen, J. T.; Mao, G.; Ober, C. K. and Thomas, E. L., "Structure Development in Side Chain Liquid Crystalline Diblock Copolymers", Proceedings of the 3rd Annual Osaka University Macromolecular Symposium, Springer (Bonn) 1999.

C. K. Ober, Chi-Yang Chao, M. Li and X. Li, "Balancing Liquid Crystallinity With Microphase Separation In Block Copolymers", Proc. ACS Div. Polym.Chem., 40(2), 482 (1999).

G. Barclay, N. Sundarajan, G. Xu, Z. Mao, C. Paddock, and C. K. Ober, "The Spatial Distribution of Photoacid Generators in Photoresist Matrices", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 81, 56 (1999)

C. K. Ober, N. Sundararajan, S. Yang, R. D. Allen, K. Ogino, A. Kameyama, and T. Mates, "Improving Resist Performance with Block Copolymer Additives", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 81, 49 (1999)

M. D. Kempe, W. Zhou, J. Kornfield, C. K. Ober and S. Wu, "Nematic Solutions of Large Molecular Weight Side-Group Liquid Crystal Polymers", Proc. ACS Div. Polym.Chem., 40(2), 488 (1999).

S. Yang, C. K. Ober, "Stable, Low Surface Energy Fluoromethacrylate Block Copolymers With Lithographic Segments", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 81, 481 (1999)

P. Gopalan, S. Pragliola, C. K.Ober, P. T. Mather, H. G. Jeon, "Mesogen--Jacketed Liquid Crystalline Polymers Via Stable Free Radical Polymerization", Proc. ACS Div. Polym.Chem., 40(2), 372 (1999).

C. K. Ober, M. Xiang, K. Char, J. Genzer, E. Sivaniah, E. J. Kramer, and D. Fischer, "Block Copolymers with Low Surface Energy, Liquid Crystalline Segments: The Interplay of Surface and Bulk Liquid Crystallinity", Proc. ACS Div. Polym.Chem., 40(2), 976 (1999).

S. Yang, J. Wang, K. Ogino,N. Sundararajan, C. K. Ober, "Synthesis And Characterization Of Micropatternable Low Surface Energy Block Copolymers", Proc. ACS Div. Polym.Chem., 40(1), 100 (1999).

C. K. Ober, M. Xiang, K. Char, J. Genzer, E. Sivaniah, E. J. Kramer, and D. Fisher, "Low Surface Energy Materials: Liquid-Crystalline Block Copolymers with Semifluorinated Monodendron Side Groups", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 80, 416 (1999)

T. Hayakawa, J. Wang, N. Sundararajan, M. Xiang, X. Li, B. Glüsen, M. Ueda and C. K. Ober, "New Photopatternable, Self-Organizing Materials for Tailored Surfaces", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 80, 486 (1999)

*J. Wang and C. K. Ober, "Solid-State Crystalline and Liquid Crystalline Structure of Semifluorinated 1-Bromoalkane Compounds", Liq. Cryst., 26(5), 637-648 (1999)..

*S. R. Clingman, G. Mao, C. K. Ober*, R. H. Colby, M. Brehmer, R. Zentel, M. Bignozzi, M. Laus, A. Angeloni, and J. R. Gillmor, "Effect of Polymer Architecture on Self-diffusion of LC Polymer", J. Polym. Sci.: Phys. Ed., 37(5), 405-414 (1999).

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1998

*P. Schofield, C. Cohen, C. K. Ober, "Synthesis and Mechanical Properties of Semi-Flexible Polymer Network", Polym. Gels and Networks, 6, 291 (1998).

*A. Merenga, S. V. Shilov, F. Kremer, G. Mao, C. K. Ober, M. Brehmer, "Molecular Orientation And Dynamics In Ferroelectric Diblock Copolymers Monitored By FT-IR Spectroscopy", Macromolecules, 31, 9008-9012 (1998).

*Hupcey, M. A. Z., Ober, Christopher K. "Copolymer Approach To Charge-Dissipating Electron Beam Resists", J. Vac. Sci. Technol., B(1998), 16(6), 3701-3704.

*Genzer, J.; Sivaniah, E.; Kramer, E. J.; Wang, J.; Korner, H.; Xiang, M.-L.; Yang, S.; Ober, C. K.; Char, K.; Chaudhury, M. K.; Dekoven, M.; Bubeck, R. A.; Fischer, D. A.; Sambasivan, S., "Surfaces of semi-fluorinated block copolymers studied using NEXAFS." Mater. Res. Soc. Symp. Proc. (1998), 524 (Applications of Synchrotron Radiation Techniques to Materials Science IV), 365-370.

*K. Ogino, J.-S. Chen and C. K. Ober, "Synthesis and Characterization of Thermally Degradable Polymer Networks", Chem. Mater., 1998, 10(12), 3833-3838.

*C. Ortiz, M. Wagner, N. Bhargava, C. K. Ober and E. J. Kramer, "Deformation of a Polydomain, Smectic Liquid Crystalline Elastomer", Macromolecules, 38, 8531-8539 (1998).

*M. D. Dadmun, S. R. Clingman, C.K. Ober and A.I. Nakatani, "The Flow Induced Structure in a Thermotropic Liquid Crystalline Polymer as Studied by SANS", J. Polym. Sci: Polym. Phys. Ed., 36(17), 3017 (1998).

Hupcey, Maggie A. Z.; Angelopoulos, Marie; Gelorme, Jeffrey D.; Ober, Christopher K. "Hydroxyethyl Substituted Polyanilines: Chemistry And Applications As Resists." Annu. Tech. Conf. - Soc. Plast. Eng. (1998), 56th(Vol. 2), 1355-1358.

Hupcey, Maggie A. Z.; Angelopoulos, Marie; Gelorme, Jeffrey D.; Ober, Christopher K., "Conducting Electron Beam Resists Based On Polyaniline". Proc. SPIE-Int. Soc. Opt. Eng. (1998), 3331(Emerging Lithographic Technologies II), 369-374.

J. A. Kornfield, B. Hirani, M. Kempe, C. Ober, Y.-U. Kim and Y.-C. Chao, "Synthesis and Dynamics of Side-Group Liquid Crystalline Polymers", Proc. ACS Div. Polym. Chem., 39(2), 1020 (1998).

M. Xiang, S. Yang and C. K. Ober, "Semifluorinated Groups As Building Blocks For Ordered Polymers", Proc. ACS Div. Polym.Chem., 39(2), 974 (1998).

N. Sundararajan, S. Valiyaveettil, K. Ogino, X. Zhou, J. Wang, S. Yang and C. K. Ober, "Block Copolymers as Supercritical CO2 Developable Photoresists", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 79, 130 (1998).

*J. Gunther, E. L. Thomas, S. Clingman and C. K. Ober, "Curvature Driven Relaxation of Disclination Loops in Liquid Crystals," Polymer 39, 4497-4504 (1998).

*C. Ortiz, C. K. Ober and E. J. Kramer, "Stress Relaxation of a Main-chain, Smectic, Polydomain Liquid Crystalline Elastomer", Polymer, (1998), 39(16), 3713-3718.

*A. Shiota, H. Körner and C. K. Ober, "Twin Nematic Phenylbenzoates in AC Electric Fields", Liquid Crystals, (1998), 25(2), 199-206.

*S. Yang, J. Chen, H. Körner, T. Breiner, C. K. Ober and M. Poliks , "Reworkable Epoxies: Thermosets With Thermally Cleavable Groups for Controlled Network Breakdown", Chem. Mater. (1998), 10(6), 1475-1482.

*G. Mao, J. Wang, C. K. Ober, M. Brehmer, E.L. Thomas and M. J. O'Rourke, "Microphase-Stabilized Ferroelectric Liquid Crystals (MSFLC): Bistable Switching of Ferroelectric Liquid Crystal-Coil Diblock Copolymers", Chem. Mater. (1998), 10(6), 1538-1545.

*C. Ortiz, R. Kim, E. Rodighiero, C. K. Ober and E. J. Kramer, "Deformation of a Polydomain, Liquid Crystalline Epoxy-Based Thermoset", Macromolecules (1998), 31(13), 4074-4088.

*S. Perutz, J. Wang, E. J. Kramer*, C. K. Ober* and K. Ellis, "Synthesis and Surface Energy Measurement of Semi-Fluorinated, Low-Energy Surfaces", Macromolecules, (1998), 31(13), 4272-4276.

C. K. Ober, K. Ogino, J. Wang, S. Valiyaveettil and N. Sundararajan, "Tailoring Polymer Thin Film Properties By Balancing Selected Molecular Interactions", Proc. ACS Div. Polym. Chem., 39(1), 727 (1998)

Ober, Christopher. "Review of Handbook of Liquid Crystal Research". Edited by Peter J. Collings (Swarthmore College) and Jay S. Patel (Pennsylvania State University). J. Am. Chem. Soc. (1998), 120(11), 2693-2694.

M. Abdallah, H. Skupin, J. Prigann, F. Kremer, S. V. Shilov, G. Mao, C. K. Ober, M. Brehmer, "Structure and Mobility in ferroelectric Liquid Crystalline Diblock Copolymers", Proceedings Freiburger Arbeitstagung Flussigkristalle, 41, 1998.

*G. Mao and C. K. Ober, "Block Copolymers Containing Liquid Crystalline Segments - An Overview", Handbook of Liquid Crystals Vol. 3, D. Demus, J. Goodby, G.W. Gray, H.-W. Spieß, V. Vill, eds., pgs. 66-92, Wiley-VCH, Weinheim 1998.

*A. Shiota and C. K. Ober, "Smectic Networks Obtained from Twin LC Epoxy Monomer: Mechanical Deformation of Smectic Networks", J. Polym. Sci.: Polym. Phys. Ed., 36, 31-38 (1998).

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1997

N. Sundararajan, J. Wang, K. Ogino, A. Kameyama, G. Mao, S. Valiyaveettil, C. K. Ober and R. D. Allen, "Block Copolymers as both Photoresists and Additives for 193 nm Imaging", Proceedings of the 11th International SPE Conference on Photopolymers, McAfee, NJ, 59-69 (1997).

*R. Colby, C. K. Ober, G. Galli and M. Laus, "The Rheology of Smectic Mesophases", Rheol. Acta, 36: (5) 498-504 1997.

*J. Wang and C. K. Ober, "Self-Organizing Materials with Low Surface Energy - Synthesis and Solid State Properties of Semifluorinated Side Chain Ionenes", Macromolecules, 30, 7560-7567 (1997).

* A. Shiota and C. K. Ober, "Analysis of Smectic Structure Formation in Liquid Crystalline Thermosets", Polymer, 38(23), 5857-5867 (1997).

*A. Shiota and C.K. Ober, "Rigid Rod and Liquid Crystalline Thermosets", Prog. Polym. Sci., 22 (5), 975-1000 (1997).

*Dai, Chi-An; Osuji, Chinedum O.; Jandt, Klaus D.; Dair, Benita J.; Ober, Christopher K.; Kramer, Edward J.; Hui, Chung-Yuen, Macromolecules, 30 (22), 1997, 6727-6736.

*G. Mao and C. K. Ober, "Block Copolymers Containing Liquid Crystalline Segments - An Overview",Acta Polymerica, 1997, 50, 405-422.

*C. K .Ober, A. H. Gabor, P. Wetmore and R.D. Allen, "Processing Imageable Polymers with Supercritical Carbon Dioxide", Adv. Mater., 9, 1039-1043 (1997).

*A. Shiota, H. Körner and C. K. Ober, "Phase Behaviour and Curing Reactions of 1,4-Benzenedicarboxylic acid bis(4-cyanatomethylphenyl) ester, Macromol. Chem. Phys., 198, 2957-2970 (1997).

*M. Muthukumar, C. K. Ober and E. L. Thomas, "Competing Molecular Interactions and the Formation of Ordered Structures on Different Length Scales in Polymers", Science, 277, 1255-1232 (1997).

*D. Barber, C. R. Pollock, L. L. Beecroft and C.K. Ober, "Amplification by Optical Composites", Optics Letters, 22(16), 1247 (1997).

S. Yang, J.-S. Chen, H. Körner, T. Breiner and C. K. Ober, "Design and Characterization of a New Reworkable Epoxy using Solvent Free, Thermally Induced Network Breakdown", Proc. ACS Div. Polym. Chem., 38(2), 440 (1997).

J. Wang, N. Sundararajan and C. K. Ober, "Using Block Copolymer As Adhesion Promoters in Photoresists", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 77, 443 (1997).

*C. K. Ober, J. G. Wang and G. P. Mao, "Order within Order: Studies of Semifluorinated Block Copolymers", Macromolecular Symposia, 118, 701-706 (1997).

*H. Körner, A. Shiota, C. K. Ober and M. Laus, "Mixtures of Liquid Crystalline and Amorphous Dicyanates: Unusual Curing Behavior and Mechanical Properties", Chem. Mater., 1997, 9, 1588-1597.

*A. Shiota and C. K. Ober, "Orientation of Liquid Crystalline Epoxies in AC Electric Fields", Macromolecules, 30, 4278-4287 (1997).

*C. K. Ober, J. Wang, G. Mao, E. J. Kramer and E. L. Thomas, "Simultaneous Organization on Different Length Scales in Liquid Crystalline Block Copolymers", Macromolecular Symposia, 117, 141-152 (1997).

*M. Brehmer, G. Mao, C. K. Ober*, R. Zentel*, "Ferroelectric Block Copolymers", Macromolecular Symposia, 117, 175-181 (1997).

*E. L. Thomas, J. T. Chen, M. J. O'Rourke, C. K. Ober and G. Mao, "Influence of a Liquid Crystalline Block on Microdomain Structure", Macromolecular Symposia, 117, 241-256 (1997).

*L. L. Beecroft, N.A. Johnen and C.K. Ober, "Covalently Linked, Transparent Silica-Poly(imide) Hybrid Materials", Polym. Adv. Tech., 8, 289-296 (1997).

*L. L. Beecroft and C. K. Ober, "Advanced Nanocomposite Materials for Optical Applications", Chem. Mater., 9, 1302-1317 (1997).

*G. Mao, J. Wang, S. R. Clingman, C. K .Ober, E. L. Thomas and J. T. Chen, "Molecular Design, Synthesis and Characterization of Liquid Crystal-Coil Diblock Copolymers with Azobenzene Side Groups", Macromolecules, 30, 2556-2567 (1997).

* Jianguo Wang, Guoping Mao, C. K. Ober, and E. J. Kramer, " Liquid Crystalline, Semifluorinated Side Group Block Copolymers with Stable Low Energy Surfaces &emdash; Synthesis, LC Structure and Critical Surface Tension", Macromolecules, 30, 1906-1914 (1997).

G. Mao, J. Wang, C. K. Ober, M. J. O'Rourke, E. L. Thomas, M. Brehmer and R. Zentel, "Microphase stabilized ferroelectric liquid crystal (MSFLC): Bistable switching of FLC-coil diblock copolymers", Polymer Preprints: Proc. ACS Div. Polym. Chem. 38(1), 374 (1997)

J. Wang, G. Mao, C. K. Ober and E. J. Kramer, "Self-Assembly of Fluorinated LC Block Copolymers with a Stable Low Energy Surface", Polymer Preprints: Proc. ACS Div. Polym. Chem. 38(1), 953 (1997)

C. K. Ober, M. A. Z. Hupcey and A. H. Gabor, "New Methacrylate Block and Random Copolymers For Submicron Lithographic Imaging", Polymer Preprints: Proc. ACS Div. Polym. Chem. 38(1), 477 (1997)

* L.L. Beecroft and C.K .Ober, "Polymers with Tailored Refractive Index for Optical Applications", JMS - Pure Appl. Chem., A34(4), 437-50 (1997).

* C. K. Ober and G. Wegner, "Polyelectrolyte-Surfactant Complexes in the Solid-State: Facile Building Blocks for Self-Organizing Materials", Adv. Mater., 9, 17-31 (1997).

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1996

* L.L. Beecroft, R.T. Leidner, C.K. Ober, D.B. Barber, and C.R. Pollock, Better Ceramics Through Chemistry VII -- Organic/Inorganic Hybrid Materials, Eds. G.L. Wilkes, D.W. Schaefer, C. Sanchez and B. Coltrain, Mat. Res. Soc. Symp. Proc., 1996, 435, p. 575-582.

* T. J. Bunning, H. Körner, V. V. Tsukruk, C. M. McHugh, C. K. Ober and W. W. Adams, "Structural Characterization of Biphenyl Ester-Based LC Molecules: Peculiarities of Cyclic Siloxane-Based Materials", Macromolecules, 29, 8717-8725 (1996).

* V.V Tsukruk, T. J. Bunning, H. Körner, C.K. Ober, W. W. Adams, "Molecular Association in Nematic Phases of Cyclic Liquid Crystal Oligomers", Macromolecules, 29, 8706-8716 (1996).

* T. J. Bunning, H. Körner, C.K. Ober and W.W. Adams, "Synchrotron Radiation For Probing the Electric Field Alignment of LC Macromolecules and Polymers" in Polymer Liquid Crystals, Vol. 4, J. Brostow and A. A. Collyer, ed., Chapman and Hall, New York (1996).

* H. Körner, A. Shiota and C. K. Ober, "The Processing Of LC Thermosets In Orienting External Fields", MRS Proceedings, Liquid Crystals for Advanced Technologies, T. J. Bunning, S. H .Chen, W. Hawthorne, T. Kajiyama and N. Koide, ed. MRS Symposium Proceedings 425, 149-160 (1996).

H. Körner, A. Shiota and C. K. Ober, "Controlled-Order Thermosets for Electronic Packaging", SPE/ANTEC '96 Proceedings, 426 (1996).

A. H. Gabor, C. K. Ober, R. D. Allen and P. Gallagher-Wetmore, "Block and Random Copolymer Resists Designed for 193 nm Lithography and Environmentally Friendly Supercritical CO2 Development", Advances in Resist Technology and Processing XIII, R. R. Kunz, ed. SPIE Proceedings 2724, 410-427 (1996).

* D. Xu, R. H. Crepeau, C. K.Ober, J. H. Freed, "Molecular Dynamics of a Liquid Crystalline Polymer Studied by Two-Dimensional Fourier Transform and CW ESR", J. Phys. Chem., 1996, 100, 15873-15885.

* D. Xu, E. Hall, C. K.Ober, J. K. Moscicki, J. H. Freed, "Translational Diffusion in Polydispersed Polymer Samples Studied by Dynamic Imaging of Diffusion ESR", J. Phys. Chem., 1996, 100, 15856-15866.

* D. Xu, D. E. Budil, C. K.Ober, J. H. Freed, "Rotational Diffusion and Order Parameters of a Liquid Crystalline Polymer Studied by ESR: Molecular Weight Dependence", J. Phys. Chem., 1996, 100, 15867-15872.

* C. K. Ober, H. Körner, A. Shiota and M. Laus, "The Curing of Dicyanate Ester Liquid Crystalline Thermosets", Angew. Makromol. Chem., 240, 59-66 (1996).

J. Wang, C. K. Ober and E. J. Kramer, "Synthesis of Novel Low Surface Energy Semifluorinated Alkyl Side Chain Ionenes", Polymer Preprints: Proc. ACS Div. Polym. Chem.37(2), 815 (1996).

S. Perutz, J. Wang, C. K. Ober and E. J. Kramer, "Adhesion between Hydrolyzed Surfaces of PDMS Networks", Polymer Preprints: Proc. ACS Div. Polym. Chem.37(2), 45 (1996).

* A. H. Gabor and C. K. Ober, "Group Transfer Polymerization of tert-Butyl Methacrylate and 3-Methacryloxypropylpentamethyldisiloxane: Synthesis and Characterization of Homopolymers, Random and Block Copolymers", Chem. Mater., 8, 2272-2281, (1996).

* A. H. Gabor, L.C. Pruette and C. K. Ober, "Lithographic Properties of Poly(tert-butyl methacrylate)-based Block and Random Copolymer Resists Designed for 193 nm Wavelength Exposure Tools", Chem. Mater., 8, 2282-2290 (1996).

* C. K. Ober and A. H. Gabor, "Block Copolymers as Lithographic Materials", J. Photopolymer Sci. & Tech., 9(1), 1-12 (1996).

* J. T. Chen, E.L. Thomas, C.K.Ober and G.-P. Mao, "Novel Self-Assembled Smectic Phases in Rod-Coil Block Copolymers", Science, 273, 343-346 (1996).

* H. Körner, A. Shiota, C.K. Ober and T. Bunning, "Orientation-On-Demand Thin Films: Curing of Liquid Crystalline Networks in AC Electric Fields", Science, 272, 252-255 (1996).

* A. Shiota and C. K. Ober, "Synthesis and Curing of Novel LC Twin Epoxy Monomers for Liquid Crystal Thermosets", J. Polym. Sci.: Polym. Chem. Ed., 34, 1291 (1996).

H. Körner and C.K. Ober, "Tuning Physical Properties And Mesophase Behavior In Liquid Crystalline Thermoset Mixtures", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 74, 133 (1996).

A. Shiota and C. K. Ober, "Building a Layered Structure from Liquid Crystalline Thermosets Materials Using an A.C. Electric Field", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 74, 137 (1996).

H. Körner and C.K. Ober, "Transient Structures of LC Polymers in Electric Fields Observed by Synchrotron Radiation", Polymer Preprints: Proc. ACS Div. Polym. Chem.37(1), 58 (1996).

* D. R. Iyengar, S. M. Perutz, C. Dai, C. K. Ober and E. J. Kramer, "Surface Segregation Studies of Fluorine-Containing Diblock Copolymers", Macromolecules, 29, 1229-1234 (1996).

* N. A. Johnen, L. L. Beecroft and C. K. Ober , "Formation Of Transparent Silica-Polymer Hybrids Based On Siloxane-Containing Poly(Imides)", in J. Hedrick and J. Labadie, ed., Recent Advances in Step Growth Polymerization, ACS Symposium Series 624, American Chemical Society, Washington, DC 1996.

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1995

* L. L. Beecroft and C.K. Ober, "Novel Ceramic Particle Synthesis For Optical Applications: Dispersion Polymerized Preceramic Microspheres As Size Templates For Fine Ceramic Powders", Adv. Mater., 1995, 7, 1009-1012.

M. Laus, R. Pernozzoli, H. Körner and C.K. Ober, "Comportamento Dinamico-Meccanico di Network Triazinici Liquido Cristallini", Proceedings of the 12th Italian AIM Congress on the Science and Technology of Macromolecules, 661, (1995).

* E. Reichmanis, C.K. Ober, S. MacDonald, T. Iwaynagi, and T. Nishikubo, ed., Microelectronics Technology: Polymers in Advanced Imaging and Packaging, ACS Symposium Series 614, American Chemical Society, Washington, DC 1995.

* ibid, A. Gabor and C.K. Ober, "Silicon-containing Block Copolymers as Microlithographic Resists", pg. 281-298.

E. Hall, C. K. Ober, R.A. Gaudiana and E. Kolb, "Melt Diffusion in Liquid Crystalline Polymers: Rigid Rod vs. Semi-Rigid Rod Model Systems", 53rd Annu. Tech. Conf. - Soc. Plast. Eng., 2, 1950-4, 1995.

A. Shiota and C. K. Ober, "Twin Mesogen Liquid Crystalline Thermosets", Polymer Preprints: Proc. ACS Div. Polym. Chem.36(2), 348 (1995).

H. Krner and C. K. Ober, "Curing Of Liquid Crystalline Networks In Electric Fields: Preparation of Oriented Thin Films", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 73, 456 (1995).

L. L. Beecroft, C. K. Ober, D. B. Barber, C. R. Pollock, J. L. Mass, and J. M. Burlitch, "Optical Composite Materials", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 73, 162 (1995).

* G. Sacripante, C.K. Ober, T. Bluhm, M. Panettoni and L. Alexandru, "Thermotropic Liquid Crystalline Polymers with Low Thermal Transitions. II. Low Melting Thermotropic Liquid Crystalline Homo- and Co-Polyesters", J. Polym. Sci.: Part A: Polym. Chem., 33, 1913-1916 (1995).

S. Clingman and C.K. Ober, "Star Branched LC Polyethers", Proc. ACS Div. Polym. Mat.: Sci. & Eng., 72, 238 (1995).

A.H. Gabor, M. Chan and C.K. Ober "Synthesis of Poly(t-Butyl Methacryate) Based Block and Random Copolymers for 193 nm Lithography, Proc. ACS Div. Polym. Mat.: Sci. & Eng., 72, 104 (1995).

C. K. Ober and N. A. Johnen, "Preparation Of Polyimide - Silica Organic / Inorganic Hybrids", Polymer Preprints: Proc. ACS Div. Polym. Chem.36(1), 715 (1995).

* S.G. McNamee, T.J. Bunning, S.S. Patnaik, W.W. Adams, and C.K. Ober, "The Effect of Electric and Magnetic Fields on the Melt Organization of a Nematic Cyclic Siloxane Liquid Crystal", Liquid Crystals, 18(5), 787-794, (1995).

* E. Hall, A. A. Robinson, S.G. McNamee, C.K. Ober, Ya. S. Freidzon, "Nematic-Smectic Biphase of a Main-Chain Liquid Crystalline Polyether", J. Mat.Sci., 30(8), 2023-2028 (1995).

* S. S. Hwang, C. K. Ober, S. Perutz, D. Iyengar, B. Schneggenburger and E. J. Kramer, "Block Copolymers With Low Surface Energy Segments: Fluorinated and Siloxane Modified Blocks", Polymer, 36(6), 1321-1325 (1995).

* J. T. Chen, E. L. Thomas, S. S. Hwang and C. K. Ober, "The Zig-Zag Morphology of a Poly(styrene-b-hexyl isocyanate) Rod-Coil Block Copolymer", Macromolecules, 28 (5), 1688-1697 (1995).

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1994

A. H. Gabor, M. Y. Chan and C. K. Ober, "Block Copolymers for Resist Applications", Proceedings of the 10th International SPE Conference on Photopolymers, Ellenville, NY, 339 - 342 (1994).

* J. R. Gillmor, R. H. Colby, E. Hall and C. K. Ober, "Viscoelastic Properties of a Model Main-Chain Liquid Crystalline Polyether", J. Rheol., 38, 1623 (1994).

* N. Johnen, H. K. Kim and C. K. Ober, "Polyphenylene Copolymers as Materials for Microelectronics", in H. Ito, S. Tagawa and K. Horie, ed., Polymeric Materials for Microelectronic Applications, ACS Symposium Series 579, American Chemical Society, Washington, DC 1994.

* C. A. Dai, K. H. Dai, C. K.Ober, E. J.Kramer, C.-Y. Hui and L. W. Jelinski, "Reinforcement of Polymer Interfaces with Random Copolymers", Phys. Rev. Let., 73(18), 2472 (1994).

* A. H. Gabor, E. A. Lehner, G. Mao, L. A. Schneggenburger and C. K. Ober, "Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks", Chem. Mater., 6, 927 (1994)

* S.G. McNamee, C.K. Ober, T.J. Bunning, C.M. McHugh and W.W. Adams, "Probing the Electric Field Alignment of a Thermotropic Liquid Crystal with Synchrotron Radiation", Liq. Cryst., 17, 179-190 (1994).

* D. G. Park, M.H.E. Martin, J.M. Burlitch, C.K. Ober, O.B. Cavin, W.D. Porter and C. R. Hubbard, "Crystallization of Precursors to Forsterite and Cr-Doped Forsterite", J. Am. Ceram. Soc., 77, 33-40 (1994).

D. Xu, J.K. Moscicki, D. Budil, J.H. Freed, E. Hall and C.K.Ober, "ESR Studies of Molecular Dynamics of a Crystalline Polyether", Polymer Preprints: Proc. ACS Div. Polym. Chem.35(1), 327 (1994).

* S. G. Mcnamee, C. K. Ober, L. W. Jelinski, E. Ray, Y. Xia, and D. Grubb, "Toward Single Fiber Diffraction Of Spider Dragline Silk From Nephila Clavipes", in D. Kaplan, W. Adams, B. Farmer, and C. Viney, ed., "Silk Polymers: Materials Science and Biotechnology", ACS Symposium Series 544, American Chemical Society, Washington, DC (1994).

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1993

* T.J. Bunning, S.G. McNamee, C.M. McHugh, S. S. Patnaik, C.K. Ober, and W.W. Adams, "Synchrotron X-Ray Radiation (CHESS) Study Of Electric-Field Induced Changes In The Structure Of Thermotropic Side-Chain Liquid Crystals" in MRS Symp. Proc. 307, 311-316, Ed., D.L. Perry, N.D. Shinn, R.L., Stockbauer, K.L. D'Amico, and L.J. Terminello, Materials Research Society, Pittsburgh, PA, 1993.

A. Gabor, E. Lehner, G. Mao, C.K.Ober, T. Long, B. Schell and R. Tiberio, "Hydrosiloxane modified styrene-diene block copolymer resists", Proc. SPIE-Int. Soc. Opt. Eng.: Advances in Resist Technology and Processing X, 1925, 499-506 (1993).

C.K. Ober, E.L. Thomas and J.Moore, "Conference Report on Synthesis Of Macromolecules with Precisely Controlled Structures for New Materials", Trends in Polymers, 1(12), 406 (1993).

C.K.Ober, "Synthetic Studies Of Poly(phenylene) and Its Copolymers For Low Dielectric, Thin Films", Proc. Int. Workshop. on Functional Organic Materials, pg. 7, Korea University, Seoul, Korea (1993).

Ya. S. Freidzon, H. Zhong and C.K.Ober, "Thermosets Based On Blends Of Liquid Crystalline Polymers And Mesogenic Dicyanates", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 698 (1993).

N. A. Johnen, H.K. Kim and C.K.Ober, "Development of New Composite Materials based on Siloxane-containing Poly(imides)", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 392 (1993).

A.H. Gabor and C.K.Ober, "Group Transfer Polymerization of Silicon-containing Methacrylates: Model Polymerization and Synthesis of Block Copolymers", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 576 (1993).

G. P. Mao, S.R. Clingman, C.K.Ober and T.E. Long, "Synthesis an Characterization of Liquid Crystal/Coil Diblock Copolymers Containing Azobenzene Moieties", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 710 (1993).

A. Robinson, S.G. McNamee, Ya. S. Freidzon and C.K.Ober, "Novel Liquid Crystalline Thermosets: Microstructural Evolution of an LC Mesophase During the Curing Process", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(2), 576 (1993)

C. K. Ober, M. H. E. Martin and L. Beecroft, "Polymer Precursors to Silicate Ceramics: Studies Of Ceramic Formation", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1), 256 (1993).

A. H. Gabor, E.A. Lehner, T. E. Long, G. Mao, E. C. Rauch, B. A. Schell, and C.K.Ober, "Hydrosilylation of Styrene-Isoprene Block Copolymers", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1), 284 (1993).

H. K. Kim, G. Yin and C.K. Ober, "Synthesis and Characterization of Polyphenylene-Silica Hybrid Materials via Sol-Gel Processing", Polymer Preprints: Proc. ACS Div. Polym. Chem.34(1), 298 (1993).

* E. Hall, C. K. Ober, E. J. Kramer, R. H. Colby, and J. R. Gillmor, "Diffusion and Melt Viscosity of a Main-Chain Liquid Crystalline Polyether", Macromolecules, 26, 3764-3771 (1993).

* H.K. Kim and C.K. Ober, "Development Of Poly(Phenylene)-Based Materials For Thin Film Applications: Optical Waveguides And Low Dielectric Materials", J. Macromol. Sci. - Pure and Appl. Chem., A30(12), 877-897 (1993).

* G.G. Barclay and C.K. Ober, "Liquid Crystalline and Rigid-Rod Networks", Prog. Polym. Sci., 18, 899-945 (1993).

* E. Hall, C.K. Ober, and G. Galli, "The Temperature Dependence of Nematic Liquid Crystalline Polymer Melt Diffusion", Liq. Cryst., 14, 1351 (1993).

* G. Galli, S. G. McNamee, and C. K. Ober, "An Investigation Of The Smectic-Isotropic Transition In A Side-Chain Liquid Crystal Polymer By Synchrotron Radiation X-Ray Diffraction", J. Polym. Sci.: Polym. Phys. Ed., 31, 773-777 (1993).

* R.H. Colby, J.R. Gillmor, G. Galli, M.Laus, C.K.Ober and E. Hall, "Linear Viscoelasticity of Side-Chain Liquid Crystalline Polymers", Liq. Cryst., 13, 233 (1993).

* T. E. Mates, C.K. Ober and R. Norwood, "Conductivity and Third-Order Nonlinear Optical Measurements of Polymers with Distyrylbenzene and Diphenylbutadiene Segments", Chem. Mater., 5(2), 217-221 (1993).

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1992

* C. K. Ober, E. Hall and G. Galli, "The Investigation of Melt Diffusion In Liquid Crystalline Polymers by Forward Recoil Spectrometry", Chim. Ind. (Milan), 74 (8/9), 579-84 (1992).

* T. E. Mates and C.K. Ober, "New Liquid Crystal Polyethers and Polyesters Based on Diphenylbutadiene Mesogens", J. Polym. Sci.: Polym. Chem. 30, 2541 (1992).

* H. K. Kim, S. Kahn, T. Mates, G. G. Barclay, and C. K. Ober, "Development Of New Polymeric Materials For Linear Waveguides", Electronic Packaging Materials Science VI, Mat. Res. Soc. Symp. Proc., 264, 347 (1992).

C.K. Ober and R. A. Weiss, "Liquid Crystalline Polymers", Condensed Matter News, 1(7), 20 (1992).

A.H. Gabor, E.A. Lehner, G. Mao, L. A. Schneggenburger and C.K. Ober, "Hydrosilation of Styrene-butadiene Block Copolymers", Polymer Preprints: Proc. ACS Div. Polym. Chem.33(2), 136 (1992).

T.J. Bunning, S.G. McNamee, H.Klei, E. T. Samulski, C.K.Ober and W.W. Adams, "Synchrotron X-ray Studies of Electric field Alignment of Liquid Crystalline Siloxanes", Polymer Preprints: Proc. ACS Div. Polym. Chem.33(1), 315 (1992).

* S. McNamee, G. Galli and C.K. Ober, "Time-resolved X-ray diffraction from Liquid Crystalline Systems: Thermotropic Phase Transitions and the Effect of Applied Electric Fields", Complex Fluids, Mat. Res. Soc. Symp. Proc., 248, 101 (1992).

* E. Hall, C.K.Ober, E.J. Kramer, R.H. Colby, J.R. Gillmor and G. Galli, "Melt Diffusion in Model Liquid Crystalline Polymers", Complex Fluids, Mat. Res. Soc. Symp. Proc., 248, 113 (1992).

* M.H.E. Martin, C. K. Ober, C.R. Hubbard, W.D. Porter and O.B.Cavin, "Poly(methacrylate) Precursors to Forsterite", J.Am. Cer. Soc., 75, 1831 (1992).

* G. G. Barclay, S. McNamee, C.K. Ober, K. Papathomas and D. Wang, "Liquid Crystalline Epoxy Thermosets: Mechanical and Magnetic Alignment", J. Polym. Sci.: Polym. Chem. Ed., 30, 1845-1853 (1992).

* G. G. Barclay, C.K. Ober, K. Papathomas and D. Wang, "Liquid Crystalline Epoxy Thermosets: Synthesis And Characterization", J. Polym. Sci.: Polym. Chem. Ed., 30, 1831-1843 (1992).

* H. K. Kim, C. R. Hove, and C. K. Ober, "Synthesis of Novel Fluorinated s-Conjugated Silicon-containing Polymers: Polysilynes and Polysilanes", JMS-Pure Appl. Chem., 29, 787 (1992).

* G. G. Barclay, C.K. Ober, K. Papathomas and D. Wang, "Rigid-rod Thermosets based on 1,3,5-Triazine Linked Aromatic Ester Segments", Macromolecules, 25, 2947 (1992).

* H.K. Kim and C.K. Ober, "Acid-catalyzed Photoaromatization of Cyclohexadiene-1,2-diol Derivatives into Polyphenylene", Polym. Bull., 28(1), 33 (1992).

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1991

G. G. Barclay, C. K. Ober, K.I. Papathomas and D.W. Wang, "Triazine Rigid-rod Networks", Polymer Preprints: Proc. ACS Div. Polym. Chem., 32(2), 336 (1991).

M.H.E. Martin and C.K.Ober, "Methacrylate Precursors to Oxide Glasses and Ceramics", Polymer Preprints: Proc. ACS Div. Polym. Chem., 32(2), 534 (1991).

* G. G. Barclay and C.K. Ober, "Liquid Crystalline Networks as Materials for Microelectronics", Materials Science of High Temperature Polymers for Microelectronics, Mat. Re