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Sputtering Deposition System

Clark D21

Three 2″ sources for magnetron argon sputtering of metals, ceramics, and reactively sputtered materials (using oxygen or nitrogen) via DC or RF power. Cryo-pumped system for ~10-6 Torr base pressures. Stages available for substrate rotation or substrate heating to ~500° C.

For rates information, please see the rates page.
Primary Contact

Steve Kriske
Clark Hall, Room D-21

Secondary Contact

Darrah Johnson-McDaniel

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