Pulsed Laser Deposition system: PLD is a deposition technique that uses energy from a Fluorine excimer laser to release material from a target and deposit it on a substrate. The system is capable of Laser fluence values at target of approximately 1.1 J/cm². The Laser is capable of pulsing at a max frequency of 20Hz. The system is equipped with a turbo molecular pump and can achieve vacuum of approximately 10-7 torr. Deposition in Oxygen or Argon atmosphere is also possible.
Configurable target carousel can hold six 1” targets or three 2” targets. Multiple substrate carriers can hold 2”, 3”, or 4” wafers; a solid plate for attaching with silver paste and a solid plate with clips. System is equipped with CCS for making compositional spreads. The system has a resistive substrate heater with max temperature of 1000°C. Heat loss between substrate and heater is ~18%.