Dedicated for sputter deposition of materials for magnetic nano-devices, this partially-automated system utilizes six 3″ magnetron sources for sputter deposition onto substrates as large as 6″ diameter. Deposition targets may include permalloy, B, Cr, Co-Fe, Cu, Ir, Mg, Mn, Nb, Al, Hf, Ru, Si, Ti, Ta, V and others. Contact manager for information.
For rates information, please see the rates page.