X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a surface analysis technique which enables compositional and chemical analysis of materials. Sensitive to 0.1 atomic%, standard analysis includes quantitative elemental analysis as well as chemical bonding information and is possible on a variety of samples (films, polymers, ceramics, powders, etc.). Our XPS systems are capable of a variety of additional techniques including:

• Ion sputtering for depth profiling or contaminant removal
• HeI and HeII ultraviolet sources for UPS analysis (valence band information and work functions possible)
• In situ sample tilting for near-surface depth analysis (angle resolved XPS or ARXPS)
• Air-free sample transfer pucks for loading directly from glove box
• Elemental or chemical imaging

Our primary XPS instrument is a Thermo Scientific Nexsa G2 Surface Analysis System.

Users can submit samples for XPS measurement by our staff, or be trained to operate the system independently.